Preparation for silicon substrate on isolator
An insulator, silicon substrate technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of difficult corrosion control, poor silicon uniformity on the top layer of SOI substrate, etc., to improve the corrosion selection ratio, maintain activity, The effect of improving uniformity
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[0020] The specific implementation of the method for preparing a silicon-on-insulator substrate provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0021] First, a first specific embodiment of the method for preparing a silicon-on-insulator substrate provided by the present invention is given. figure 1 Shown is a flow chart of the implementation steps of the specific embodiment, including the following steps: Step S101, a single crystal silicon substrate is provided, and the doping concentration of the surface of the single crystal silicon substrate is D 1 Step S102, grow a doped single crystal silicon layer on the surface of the single crystal silicon substrate, the doped single crystal silicon layer and the single crystal silicon substrate have the same doping material, and the doping concentration of the doped single crystal silicon layer For D 2 , D 1 Not equal to D 2Step S103, provide a supporting substrate, the ...
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