Production method of double-pump wavelength-adjustable broad band full-wavelength converter
A technology of wavelength converter and fabrication method, applied in optics, instruments, optical demodulation, etc., can solve problems such as low pump power threshold inconsistency, high pump light power, conversion efficiency sag, etc., and achieve full utilization of fiber bandwidth resources, overcoming conversion dips, effects of low power thresholds
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Embodiment 1
[0031] The first step is to select a Z-cut lithium niobate wafer with a magnesium-doped molar ratio of 3%-7%, first fabricate a titanium diffused waveguide structure on the -Z plane of the wafer, and then fabricate a A periodic optical superlattice with a period range of 20-25 μm, that is, by polarizing the wafer with an electric field at room temperature to achieve periodic inversion of the crystal polarization domain; the details are as follows:
[0032] (1) Select a Z-cut magnesium-doped lithium niobate wafer with a size of 20×10×1 mm, that is, a thickness of 1 mm and a 5% mol doping ratio, and polish the + / -Z surfaces.
[0033] (2) Fabricate a strip waveguide with a width of 6 μm by titanium diffusion technology on the -Z plane;
[0034] (3) Form an array metal positive electrode with a period of 20.4 μm, a width of 8 μm, and a length of 10 mm (assuming a duty ratio of 8:12.4) on the +Z surface by photolithography. The grating period is substituted into the formula by the S...
Embodiment 2
[0043] The first step is to select a Z-cut lithium niobate wafer with a magnesium-doped molar ratio of 3%-7%, first fabricate a titanium diffused waveguide structure on the -Z plane of the wafer, and then fabricate a A periodic optical superlattice with a period range of 20-25 μm, that is, by polarizing the wafer with an electric field at room temperature to achieve periodic inversion of the crystal polarization domain; the details are as follows:
[0044] (1) Choose a Z-cut magnesium-doped lithium niobate wafer with a size of 20×10×1 mm, that is, a thickness of 1 mm and a 7% mol doping ratio, and polish the + / -Z surfaces.
[0045] (2) Fabricate a strip waveguide with a width of 6 μm by titanium diffusion technology on the -Z plane;
[0046] (3) Form an array metal positive electrode with a period of 23.4 μm, a width of 8 μm, and a length of 10 mm (assuming a duty ratio of 8:12.4) on the +Z surface by photolithography. The grating period is substituted into the formula by the...
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