Product with holographic pattern and manufacturing method thereof
A production method and hologram technology, which are applied to the photo-engraving process of the pattern surface, the copying of printed matter and printing plates, etc., can solve the problems of high cost, non-existence, and inability to exert the advantages of hand feeling, so as to simplify the production process and reduce the Cost, reduction in fabrication and effect of hot-press release transfer process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0026] This embodiment is used to illustrate the material with holographic pattern and its manufacturing method provided by the present invention.
[0027] 1. Make an optical mask
[0028] Photoresist (Suzhou Ruihong Company, RZJ-396PG) was uniformly coated on a glass plate with a thickness of 2 mm, and dried to form a photosensitive plate with a photosensitive layer thickness of 2 microns.
[0029] Use photolithography machine (U.S. ABM company) to make above-mentioned photosensitive plate expose with the form of hologram pattern, exposure energy is 300 millijoules / square centimeter, and develop in developing solution (0.7% by weight sodium hydroxide aqueous solution), developing solution The temperature is 20° C., and the developing time is 30 seconds, and an optical mask can be prepared.
[0030] 2. Making metal plates
[0031] Spray silver on the surface of the optical mask prepared in step 1 with the holographic pattern. Then wash with 20 g / L NaOH solution; passivate w...
Embodiment 2
[0035] This embodiment is used to illustrate the material with holographic pattern and its manufacturing method provided by the present invention.
[0036] According to the same method as in Example 1, the material with holographic pattern is made, and the difference is that the electric current of electroforming in step 2 is: 5 amps, and the time is 900 minutes, and the thickness of the nickel electroformed plate obtained is 80 microns; The temperature of molding in 3 is 100° C., and the speed of molding is 50 m / min.
Embodiment 3
[0038] This embodiment is used to illustrate the material with holographic pattern and its manufacturing method provided by the present invention.
[0039] 1. Make the material with holographic patterns according to the same method as in Example 1, the difference is that the electric current of electroforming in step 2 is: 100 amps, the time is 60 minutes, and the thickness of the nickel electroformed plate obtained is 120 microns ; The molding temperature in step 3 is 130° C., and the molding speed is 20 m / min.
[0040] 2. Prepare UV-curable coatings according to the following method:
[0041] Mix 4 grams of photoinitiator (darocurl173) with 5 grams of diluent (toluene: butyl acetate = 1: 1), stir until fully dissolved, and obtain a solution containing photoinitiator;
[0042] With 40 grams of 10-functional polyurethane acrylate resin (Nippon Synthetic Chemical Co., Ltd., the model is 1700B, the viscosity at 60 ° C is 1500cP, the functionality is 10, and the hardness is 8H) ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com