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Method for preparing anti-attrition MoS2/C/Ti composite film by magnetron sputtering

A technology of magnetron sputtering and composite thin film, which is applied in sputtering plating, ion implantation plating, coating, etc., and can solve the problem of insufficient carrying capacity and wear resistance of the film, poor bonding force of the metal substrate, and large internal stress, etc. problems, to achieve the effect of easy control of the deposition process, enhanced bonding strength, and high bonding force

Inactive Publication Date: 2010-02-24
SHANGHAI JIAO TONG UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But pure MoS 2 / DLC or WS 2 / DLC composite film due to the large internal stress and poor bonding force with the metal substrate, the bearing capacity and wear resistance of the film under a large load are insufficient, and premature failure (wear-through, shedding) will occur

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -4 Pa, enter argon gas, adjust the pressure in the vacuum chamber to 0.3Pa, turn on the power, DC sputter Ti target with a thickness of about 100nm, sputtering power of 80W, working pressure of 0.3Pa, sputtering time of about 40min, turn off the power. Keep the indoor air pressure at 0.3Pa, turn on the power, and sputter MoS with radio frequency 2 Target, power 100W, DC sputtering graphite target, power 10W, DC sputtering Ti target, power 10W, working pressure 0.3Pa, sputtering time 20 minutes, turn off the power, and open the vacuum chamber after the temperature of the vacuum chamber drops to room temperature , to make a film with a film thickness of about 0.5 μm.

Embodiment 2

[0022] Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -4 Pa, enter argon gas, adjust the pressure in the vacuum chamber to 0.3Pa, turn on the power, DC sputter Ti target with a thickness of about 100nm, sputtering power of 80W, working pressure of 0.3Pa, sputtering time of about 40min, turn off the power. Adjust and keep the indoor air pressure at 0.2Pa, turn on the power, and sputter MoS with radio frequency 2 Target, power 150W, DC sputtering graphite target, power 10W, DC sputtering Ti target, power 5W, working pressure 0.2Pa, sputtering time 33 minutes, turn off the power, after the temperature of the vacuum chamber drops to room temperature, open the vacuum chamber , to make a film with a film thickness of about 0.7 μm.

Embodiment 3

[0024] Polish the stainless steel substrate to a smoothness of less than 0.05 μm, clean it with alcohol and acetone in an ultrasonic cleaner, dry it, and put it into a sputtering chamber. Vacuum to 10 -4 Pa, enter argon gas, adjust the pressure in the vacuum chamber to 0.3Pa, turn on the power, DC sputter Ti target with a thickness of about 100nm, sputtering power of 80W, working pressure of 0.3Pa, sputtering time of about 40min, turn off the power. Adjust to keep the indoor air pressure at 1Pa, and use RF sputtering of MoS 2 Target, power 200W, DC sputtering graphite target, power 15W, DC sputtering Ti target, power 5W, working pressure 1Pa, sputtering time 50 minutes, turn off the power, after the temperature of the vacuum chamber drops to room temperature, open the vacuum chamber, A film having a film thickness of about 2.0 µm was produced.

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Abstract

The invention discloses a method for preparing an anti-attrition MoS2 / C / Ti composite film by magnetron sputtering in the technical field of solid lubrication, comprising the following steps: firstly,polishing a substrate, then ultrasonically washing and drying the substrate, and then packing the substrate in a sputtering chamber; secondly, carrying out pure titanium sputtering and composite layersputtering in the sputtering chamber, then obtaining the anti-attrition composite film by magnetron sputtering when the sputtering chamber is naturally cooled to the room temperature. The invention has simple process and easily controlled precipitation process; the precipitated film can be directly used as an anti-attrition protection film on the surface of a mechanical part without thermal treatment; and the composite film has the nano hardness of 5.9GPa and the friction coefficient of 0.03.

Description

technical field [0001] The invention relates to a thin film in the field of solid lubrication technology and a preparation method thereof, in particular to a wear-reducing MoS prepared by magnetron sputtering 2 / C / Ti composite film method. Background technique [0002] Ordinary layered structure (2H) transition metal sulfide MoS 2 The crystal is a hexagonal structure formed by S-Mo-S atoms. In each layer, the S-Mo atoms are bonded by strong covalent bonds, and the layers are bonded by weak van der Waals bonds. Easy to slide between layers. As a solid lubricant, MoS 2 It has the characteristics of small friction coefficient, large bearing capacity and good wear resistance, and has strong bonding force with the base material, low evaporation rate and radiation resistance. However, due to the layered structure of MoS 2 The unsaturated dangling bonds at the edge of the crystal are chemically active, and are easily bonded to the metal surface and oxidized during the friction...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/14C23C14/06C23C14/02
Inventor 李倩倩周磊尹桂林余震何丹农
Owner SHANGHAI JIAO TONG UNIV
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