Preparation method of silicane gas
A technology of gas and silane, which is applied in the field of electronic gas preparation, can solve the problems of difficult control of catalytic rate, low reaction activity, and easy hydrolysis of products, so as to inhibit the reaction of copper-catalyzed decomposition of alcohol dehydrogenation, increase reaction yield, and promote The effect of reaction rate
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specific Embodiment approach 1
[0026] Specific embodiment one: the preparation method of a kind of silane gas of this embodiment is realized through the following steps:
[0027] 1. Synthesis of trialkoxysilane: a. Put 100 mesh to 350 mesh metallurgical grade silicon powder in a mixed acid of hydrofluoric acid and nitric acid, and then etch for 0.5 to 2 minutes under the action of ultrasound, and then etch The silica powder is rinsed to neutrality and then dried, wherein the ratio of the amount of hydrofluoric acid to nitric acid is (1 / 10~10): 1;
[0028] b. Add the silicon powder etched in step a to the copper-based catalyst pre-precipitation solution, vacuumize, and then under the action of ultrasound, add the precipitation initiator to the mixed solution of the silicon powder and the copper-based catalyst pre-precipitation solution until no Copper-based catalyst precipitates are formed, then filtered, and then vacuum-dried to obtain a copper-based catalyst-coated silicon powder complex, and then pretreat...
specific Embodiment approach 2
[0037] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the particle size of the silicon powder in step 1 a is 200 mesh. Other steps and parameters are the same as those in Embodiment 1.
[0038] In this embodiment, silicon powder is a commercial product.
specific Embodiment approach 3
[0039] Embodiment 3: The difference between this embodiment and Embodiment 1 or 2 is that the ultrasonic frequency of the ultrasonic action in Step 1 a is 40-80KHz. Other steps and parameters are the same as those in Embodiment 1 or Embodiment 2.
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