Method for cleaning metallurgical silicon material
A metallurgical-grade silicon, cleaning technology, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc., can solve problems such as high content, and achieve the effect of fast reaction rate
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Embodiment 1
[0028] In the ventilated acid tank, configure the impurity removal solution according to the following volume ratio: HF:HNO 3 =1:20, HF concentration 48%, HNO 3 Concentration of 68%, soak and clean the metallurgical silicon material of grade 8N together for the same soaking time, take out the cleaned silicon material, and use pure water for secondary cleaning, constantly turn the raw material during washing, and then perform ultrasonic cleaning Wash with tertiary pure water, take out the silicon material when the pH of the washing solution is 7, and dry it. It is measured that the reaction rate ratio of metallurgical silicon material and IC material is 1.12:1, that is, the reaction rate of silicon material with high impurity content is higher than that of low impurity content under this ratio, and this acid ratio can selectively corrode silicon material Effect.
Embodiment 2
[0030] In the ventilated acid tank, configure the impurity removal solution according to the following volume ratio: HF:HNO 3 =1:20, HF concentration 48%, HNO 3 With a concentration of 68%, the metallurgical silicon material of grade 6N are soaked and cleaned together for the same soaking time, and the cleaned silicon material is taken out and cleaned with pure water for secondary cleaning. Washing and rinsing with tertiary pure water, until the pH of the washing solution is 7, pick up the silicon material and dry it. The measured reaction rate ratio of metallurgical silicon material to polycrystalline material is 1.05:1, that is, the reaction rate of silicon material with high impurity content is higher than that of low impurity content under this ratio, and this acid ratio is selective for silicon material The effect of corrosion.
Embodiment 3
[0032] In the ventilated acid tank, configure the impurity removal solution according to the following volume ratio: HF:HNO 3 =1:16, HF concentration 48%, HNO 3 The concentration is 68%. Soak and clean the metallurgical silicon material of grade 8N. Then perform ultrasonic cleaning and tertiary pure water cleaning, and when the pH of the washing solution is 7, pick up the silicon material and dry it. It is measured that the reaction rate ratio of metallurgical silicon material and IC material is 1.06:1, that is, the reaction rate of silicon material with high impurity content is higher than that of low impurity content under this ratio, and this acid ratio is selective for silicon material The effect of corrosion.
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