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Device and method for plasma to synthesize hydrogen peroxide

A hydrogen peroxide and plasma technology, applied in directions such as hydrogen peroxide, can solve the problems of large proportion gap, easy poisoning of palladium film, low yield, etc., and achieve the effects of improving yield and reducing water generation.

Active Publication Date: 2012-06-13
718TH RES INST OF CHINA SHIPBUILDING INDAL CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The method of using palladium membrane as a catalyst to catalyze hydrogen and oxygen to synthesize hydrogen peroxide has disadvantages such as low yield, difficult control, and easy poisoning of palladium membrane, and has not been applied industrially.
The device and method for directly synthesizing hydrogen peroxide by the dielectric barrier discharge plasma method at room temperature must control the ratio of hydrogen and oxygen gas within the explosion limit, that is, the concentration of hydrogen is 94% to 100%, and the concentration of oxygen is 94% to 100%. The concentration is 0% to 6%. This method has a certain risk of explosion when configuring the mixed gas. In addition, due to the large difference in the ratio of hydrogen and oxygen, the utilization rate of active species is low, and the yield of hydrogen peroxide is also low.

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  • Device and method for plasma to synthesize hydrogen peroxide
  • Device and method for plasma to synthesize hydrogen peroxide
  • Device and method for plasma to synthesize hydrogen peroxide

Examples

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Effect test

Embodiment 1

[0022] A device for synthesizing hydrogen peroxide by plasma, such as figure 1 As shown, the device is a coaxial casing reactor including a central electrode 2, a partition wall 3, a nozzle electrode 8 and a cooling sleeve 5; The area is the hydrogen zone 1, and there is a hydrogen gas inlet 10 at the top of the hydrogen zone 1; there is a nozzle electrode 8 on the outer layer of the partition wall 3, and a cooling sleeve 5 on the outside of the nozzle electrode 8, and the inner wall of the cooling sleeve 5 The area surrounded by the nozzle electrode 8 is the oxygen zone 7, and there is an oxygen inlet 11 at the top of the oxygen zone 7, and a discharge outlet 13 at the bottom end of the oxygen zone 7; the area between the inner wall and the outer wall of the cooling sleeve 5 is The cooling zone 6 is the coolant inlet 4 at the bottom of the cooling zone 6, and the coolant outlet 12 at the top of the cooling zone 6;

[0023] A method for synthesizing hydrogen peroxide by plasm...

Embodiment 2

[0029] A device for synthesizing hydrogen peroxide by plasma, such as figure 2 As shown, the device is a 2-layer separator type reactor including a center electrode 2, a partition wall 3, a nozzle electrode 8 and a cooling sleeve 5; the outer side of the center electrode 2 is a partition wall 3, and the center electrode 2 and the partition wall 3 surround The area is the hydrogen zone 1, and there is a hydrogen gas inlet 10 at the top of the hydrogen zone 1; there is a nozzle electrode 8 on the outer layer of the partition wall 3, and a cooling sleeve 5 on the outside of the nozzle electrode 8, and the inner wall of the cooling sleeve 5 The area surrounded by the nozzle electrode 8 is the oxygen zone 7, and there is an oxygen inlet 11 at the top of the oxygen zone 7, and a discharge outlet 13 at the bottom end of the oxygen zone 7; the area between the inner wall and the outer wall of the cooling sleeve 5 is The cooling zone 6 is the coolant inlet 4 at the bottom of the cooli...

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Abstract

The invention relates to a device and a method for plasma to synthesize hydrogen peroxide, belonging to the technical field of using the plasma to synthesize chemicals. The device comprises a center electrode, a dividing wall, a nozzle electrode and a cooling sleeve. A coolant is filled for cooling, and a power supply is switched on; hydrogen gas is filled; a plasma discharging field is formed between the center electrode and the nozzle electrode; at this time, the hydrogen gas is ionized to form the active hydrogen plasma; oxygen gas is filled, and the pressure of the hydrogen gas is kept higher than that of the oxygen gas; the active hydrogen plasma is sprayed into an oxygen zone, reaction is carried out between the active hydrogen plasma and the oxygen gas to generate hydrogen peroxide, the hydrogen peroxide is absorbed by water through excessive oxygen gas from an exhaust outlet so as to obtain water solution of the hydrogen peroxide, and finally the hydrogen peroxide is obtained through processing. The invention increases the yield of the hydrogen peroxide and the oxygen gas cannot be excited by an electric field, so as to avoid the generation of a large quantity of active oxygen, thereby reducing the generation of water. The invention can prepare high-purity hydrogen peroxide on the spot, so as to meet the using requirements in the industries of medical, industrial, astronautic, military and the like.

Description

technical field [0001] The invention relates to a device and method for synthesizing hydrogen peroxide by plasma, and belongs to the technical field of plasma synthesizing chemicals. Background technique [0002] Hydrogen peroxide is known as a green oxidant and the cleanest chemical product, and has a wide range of uses in liquid crystal manufacturing, electronic chip manufacturing, chemical industry, textile, papermaking, medicine and health, and military industries. [0003] At present, the process method for producing hydrogen peroxide is mainly the quinone method, and the annual output has reached several million tons. However, due to the use of quinone and organic solvents, there is a certain pollution in the production, and the hydrogen peroxide product has a high impurity content. Transporting high concentrations of hydrogen peroxide is quite dangerous. [0004] Many new technological methods for producing hydrogen peroxide are continuously developed, such as a meth...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B15/01
Inventor 周钧周军成陈兆文范海明董强
Owner 718TH RES INST OF CHINA SHIPBUILDING INDAL CORP