Preparation method of Al-Doped ZnO film

A technology of aluminum-doped zinc oxide thin film, which is applied in the field of preparation of aluminum-doped zinc oxide thin film, can solve the problems of high cost, complex equipment, unsuitable for large-area preparation, etc., and achieve the effect of no need for high temperature, no need for vacuum equipment, and simple process

Inactive Publication Date: 2010-08-11
SHANGHAI JIAO TONG UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Find through literature retrieval of prior art, C.G.Granqvist etc. publish Optical properties of sputter-deposited ZnO:Al thin films (utilize the magnetron sputtering method to prepare) in " Journal of AppliedPhysics " 1988 volume 64 the 10th phase 5117-5131 pages Optical properties of aluminum-doped zinc oxide thin film), since 1988, professionals have developed a variety of preparation methods, such as magnetron sputtering, chemical vapor deposition, etc., but there are complex equipment, high cost, and unsuitable for large-scale production. Disadvantages such as area preparation

Method used

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  • Preparation method of Al-Doped ZnO film
  • Preparation method of Al-Doped ZnO film
  • Preparation method of Al-Doped ZnO film

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Embodiment 1

[0027] 500mg of AZO nanoparticles (20nm, where the aluminum content is 5%) were dispersed into a flask with 10ml of absolute ethanol, and the solution was ultrasonically treated for 15 minutes to obtain a uniformly dispersed solution of AZO; then 10mg of alkyl silane coupling was added agent and 10 mg 1-hydroxycyclohexyl phenyl ketone, and continued ultrasonic treatment for 2 hours; the surface-modified AZO nanoparticles were coated on the glass substrate by spin coating method, and irradiated with ultraviolet light with a wavelength of 254nm for 2min; Heat treatment at 200° C. for 4 hours in a nitrogen atmosphere to obtain an AZO film.

Embodiment 2

[0029] 1.5g of AZO nanoparticles (40nm, wherein the aluminum content is 20%) was dispersed in a flask with 10ml of absolute ethanol, and the solution was ultrasonically treated for 10 minutes to obtain a uniformly dispersed solution of AZO; then 15mg of vinyl silane was added. Joint agent and 5mg 1-hydroxycyclohexyl phenyl ketone. Continue to sonicate for 0.5 hours; use the spin coating method to coat the surface-modified AZO nanoparticles on the glass substrate, and irradiate with ultraviolet light with a wavelength of 254nm for 0.5min; finally heat treat at 200°C for 0.5 hours in a nitrogen atmosphere to obtain AZO film.

Embodiment 3

[0031] 3g AZO nanoparticles (30nm, wherein aluminum content is 15%) are dispersed in the flask that 10ml dehydrated alcohol is housed, the solution is sonicated for 20 minutes, obtain AZO homogeneously dispersed solution; Combined agent and 40mg of 2-hydroxy-methylphenylpropan-1-one, continue ultrasonic treatment for 4 hours; finally use the spin coating method to coat the surface-modified AZO nanoparticles on the glass substrate, and use a wavelength of 254nm UV light irradiation for 1 min; finally heat treatment at 200° C. for 4 hours in a hydrogen atmosphere to obtain an AZO film.

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Abstract

The invention discloses a preparation method of an Al-Doped ZnO film, which comprises the following steps of: adding AZO nano particles in a medium; ultrasonically processing a solution for 10-30 minutes to obtain uniform and dispersive nano particle seriflux; adding a coupling agent and a photoinitiator in the seriflux; after adding the coupling agent, carrying out ultrasonic treatment for 0.5-8 hours; spreading AZO nano particle seriflux on glass by using a pulling method or a spinning method and irradiating by ultraviolet light; and then carrying out heat treatment to obtain the ZAO film. The invention does not need vacuum equipment or high temperature, has simple structure, and is suitable for large-scale production.

Description

technical field [0001] The invention relates to a preparation method in the technical field of photoelectric materials, in particular to a preparation method of aluminum-doped zinc oxide (AZO) thin film. Background technique [0002] Al-doped zinc oxide thin film is widely used because of its excellent properties of transparency and conductivity. It is a solar cell window layer material that has developed rapidly in recent years and has broad prospects. The elements zinc and aluminum in the AZO film are very abundant in the earth, and it does not contain toxic components, so it is friendly to the environment. At present, the main application areas are flat-panel liquid crystal display (LCD), electroluminescence (ELD), transparent electrodes of solar cells, low-emissivity glass, electromagnetic shielding materials and so on. [0003] Find through literature retrieval of prior art, C.G.Granqvist etc. publish Optical properties of sputter-deposited ZnO:Al thin films (utilize t...

Claims

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Application Information

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IPC IPC(8): C03C17/23
Inventor 魏浩王艳艳苏言杰张亚非柳颖
Owner SHANGHAI JIAO TONG UNIV
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