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High temperature solar energy selective absorption coating and preparation method thereof

A technology for absorbing coating and solar energy, applied in the field of solar energy utilization, can solve the problems of low process deposition rate, long production cycle, complex process, etc., and achieve the effects of low price, convenient operation and simple preparation process

Inactive Publication Date: 2011-07-27
CANGZHOU TRX SOLAR TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, processes such as double-target or multi-target co-sputtering and RF sputtering have low deposition rates, long production cycles, complex processes, and high costs.

Method used

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  • High temperature solar energy selective absorption coating and preparation method thereof
  • High temperature solar energy selective absorption coating and preparation method thereof

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preparation example Construction

[0025] A preparation method for a solar selective absorbing coating, comprising the following steps:

[0026] Step 1: preparing the first infrared emitting layer on the substrate;

[0027] The pure metal target intermediate frequency magnetron sputtering method is adopted, the pure metal target is Ti target or Al target, Ar gas is used as the sputtering gas, and the substrate is made of high-speed steel. Before sputtering, the vacuum chamber was pre-evacuated to a background vacuum of 4×10 -3 ~5×10 -3 Pa, into the inert gas Ar as the sputtering atmosphere, adjust the sputtering distance to 130 ~ 150mm, adjust the sputtering pressure to 3 × 10 -1 ~4×10 -1 Pa. Turn on the power supply of the sputtering target of the pure metal target, adjust the sputtering voltage to 380-450V, and the sputtering current to 8-10A. It is prepared by intermediate frequency sputtering. The thickness of the coating is 50-250nm. Reflective properties, low emissivity;

[0028] Step 2: preparing a...

Embodiment

[0038] Prepare a kind of solar energy selective absorbing coating, comprise three coatings namely the first layer infrared reflective layer, the second layer absorbing layer, the third layer anti-reflection layer, the thickness of the first layer is 100~250nm, the total thickness of the second layer 110-150 nm, wherein the thickness of the first sub-layer is 60-80 nm, the thickness of the second sub-layer is 50-70 nm, and the thickness of the third layer is 30-50 nm. The preparation steps are as follows:

[0039] Step 1: preparing the first infrared emitting layer on the substrate;

[0040] A Ti target with a purity of 99.99% and an Al target with a purity of 99.99% are selected, and high-speed steel is used as the base material. Before sputtering, the vacuum chamber was pre-evacuated to a background vacuum of 4.5×10 -3 ~5×10 -3 Pa, the inert gas Ar is introduced as the sputtering atmosphere, the sputtering distance is adjusted to 140-150mm, and the sputtering pressure is a...

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Abstract

The invention discloses a high temperature solar energy selective absorption coating and a preparation method thereof. The coating comprises an infrared reflecting layer, an absorbing layer and an antireflection layer from the bottom layer to the surface, wherein the first infrared reflecting layer comprises any of a Ti film, an Al film or a TiAl alloy film, and is 50-250nm thick; the second absorbing layer comprises two sublayer structures which are both TiAlCN+TiAl films and are 50-100nm thick, and the volume percent of the first sublayer TiAl is greater than the volume percent of the second sublayer TiAl; and the third antireflection layer comprises any of a TiO2 film or an Al2O3 film and is 20-60nm thick. The infrared reflecting layer is prepared on a matrix surface by a pure metal target medium frequency magnetron sputtering method, the second absorbing layer is prepared on the first layer by a metal Ti target and Al target medium frequency magnetron sputtering method, and the third antireflection layer is prepared on the second layer by the metal target medium frequency magnetron sputtering method.

Description

technical field [0001] The invention relates to the technical field of solar energy utilization, in particular to a high-temperature solar energy selective absorption coating and a preparation method thereof. Background technique [0002] The solar spectrum selective absorption coating has a high absorption rate in the visible-near-infrared band and a functional film with a low emissivity in the infrared band, which is the key to improving the efficiency of light-to-heat conversion for solar collectors. With the continuous development of solar heat utilization requirements and technology, the application range of solar collector tubes has been developed from low temperature applications (≤100°C) to medium temperature applications (100°C-350°C) and high temperature applications (350°C-500°C). Meet the requirements of medium and high temperature applications such as seawater desalination and solar power generation. The selective absorption coating used for the heat collecting...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/16C23C14/08F24J2/48
CPCY02E10/40
Inventor 张秀廷刘雪莲薛文卢铁军范兵陈步亮
Owner CANGZHOU TRX SOLAR TECH
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