Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing graphene oxide with high fluorescent quantum yield

A fluorescent quantum yield and graphene technology, applied in chemical instruments and methods, luminescent materials, etc., can solve the problems of weak photoluminescence, limited application, and observation, and achieve the effects of low cost, easy promotion, and simple operation

Inactive Publication Date: 2013-02-27
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the photoluminescence of these graphene oxides is very weak and cannot be directly observed with the naked eye under ultraviolet light, which limits its application in biomarkers and cell imaging.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing graphene oxide with high fluorescent quantum yield
  • Method for preparing graphene oxide with high fluorescent quantum yield
  • Method for preparing graphene oxide with high fluorescent quantum yield

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] (1) Heat 25ml of concentrated sulfuric acid to 90°C, add 1g of K 2 S 2 o 8 and 1g P 2 o 5 , 1.2g of graphite flakes were reacted for 4.5h, and the reacted product was diluted with 200ml of deionized water, filtered, washed, and then dried in a vacuum oven. Take 0.1g of dried pretreated graphite and add 23ml of concentrated sulfuric acid and 1g of KMnO 4 React at 35°C for 2h, then add 46ml of water and react at 95°C for 0.5h, and finally add 3ml of H 2 o 2 The reaction was terminated, the obtained product was centrifuged, and washed five times with deionized water and 10% HCl solution, and the finally obtained solid was put into a vacuum oven for drying;

[0028] (2) Take 20 mg of dried graphite oxide, add 1 ml of anhydrous DMF, and obtain graphene oxide by ultrasonication for 30 minutes, then add 20 ml of thionyl chloride, and reflux at 80 ° C for 24 hours under nitrogen protection. Then centrifuge to remove unreacted thionyl chloride, wash twice with anhydrous t...

Embodiment 2

[0032] (1) Heat 25ml of concentrated sulfuric acid to 90°C, add 1g of K 2 S 2 o 8 and 1g P 2 o 5 , 1.2g of graphite flakes were reacted for 4.5h, and the reacted product was diluted with 200ml of deionized water, filtered, washed, and then dried in a vacuum oven. Take 0.1g of dried pretreated graphite and add 23ml of concentrated sulfuric acid and 1g of KMnO 4 React at 35°C for 2h, then add 46ml of water and react at 95°C for 0.5h, and finally add 3ml of H 2 o 2 The reaction was terminated, the obtained product was centrifuged, and washed five times with deionized water and 10% HCl solution, and the finally obtained solid was put into a vacuum oven for drying;

[0033](2) Take 20 mg of dried graphite oxide, add 1 ml of anhydrous DMF, and peel off graphene oxide by ultrasonication for 30 min, then add 20 ml of thionyl chloride, reflux at 80°C for 24 hours under nitrogen protection. Then centrifuge to remove unreacted thionyl chloride, wash twice with anhydrous tetrahydro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
fluorescence quantum yieldaaaaaaaaaa
fluorescence quantum yieldaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for preparing graphene oxide with high fluorescent quantum yield, which comprises the following steps of: oxidizing and ultrasonically peeling the graphite sheets serving as a starting raw material to obtain the graphene oxide; performing reflux reaction on the graphene oxide and thionyl chloride under the protection of nitrogen for 24 to 72 hours to obtain the intermediate chlorinated graphene oxide; and reacting the intermediate with excess alkylamine at the temperature of between 60 and 120 DEG C for 24 to 72 hours under the protection of the nitrogen to obtain the graphene oxide modified by the alkylamine. The product has strong blue fluorescent light with the fluorescence efficiency more than or equal to 10 percent, high biocompatibility and low cell toxicity, and can be widely applied to the biomarker and cell imaging.

Description

[0001] 1. Field [0002] The invention relates to a method for modifying graphene oxide, a carbon nanomaterial, in particular to a method for preparing graphene oxide with high fluorescence quantum yield. 2. Background technology [0003] In recent years, fluorescent carbon nanomaterials, including carbon nanotubes, nanodiamonds, and carbon nanoparticles (carbon quantum dots), have shown better biocompatibility and low cytotoxicity compared to fluorescent semiconductor quantum dots. , are increasingly favored by people and are widely used in biomarkers and cell imaging. These carbon nanomaterials are usually prepared from graphite as a precursor under very expensive equipment and extreme conditions, such as vacuum discharge, laser ablation, high temperature and high pressure, etc., which limit their wide application. [0004] Graphene oxide is a new carbon nanomaterial obtained by ultrasonic exfoliation after chemical oxidation of graphite. It is a single-layer graphite stru...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C09K11/65
Inventor 张忠平梅青松王素华
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products