Method for preparing ultra nanometer diamond coating of ceramic valve core
A technology of diamond coating and ceramic valve core, applied in the direction of metal material coating process, coating, valve device, etc., can solve the problems of rising cost of domestic products, insufficient surface performance, insufficient wear resistance, etc., to improve performance and Good quality, good wear resistance and extended service life
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Embodiment 1
[0023] Put the ceramic valve core of the flat faucet in 90°C 10mol / l nitric acid solution to etch for 12 hours, take it out and rinse it with water; then place it in an ethanol suspension with 0.5 μm diamond micropowder, and use an ultrasonic generator for ultrasonic grinding for 20 minutes; then use Clean the sample with ethanol solution, dry it, place it in the microwave plasma reaction chamber, vacuumize, turn on the microwave generator, control the gas flow rate to 500-800mL / min, and the working gas is CH 4 and Ar, CH 4 The concentration is 1% to 2%, and then the microwave power is increased to 1200W to 1300W, the gas pressure is maintained at 10000 to 13000Pa, the temperature of the ceramic valve core is 800 to 900°C, and maintained for 4 to 5 hours, and finally the microwave power is gradually reduced to slowly reduce the sample to room temperature.
Embodiment 2
[0025] Put the ceramic valve core of the flat faucet into the molten KOH inside the muffle furnace at 420°C to etch the surface for 5 minutes, take it out and rinse it with water; then place it in an ethanol suspension with 0.5 μm diamond micropowder, and use an ultrasonic generator for ultrasonic grinding 20min; then the sample was cleaned and dried with ethanol solution, and placed in a microwave plasma reaction chamber, the growth process of the ultra-nano-diamond coating was the same as in Example 1.
Embodiment 3
[0027] Carry out acid (or alkali) etching and ultrasonic grinding treatment (as described in Example 1 or Example 2) to the ceramic valve core of the flat faucet, place it in the microwave plasma reaction chamber, evacuate, turn on the microwave generator, The control gas flow rate is 500-800mL / min, and the working gas is CH 4 , Ar and H 2 mixture, CH 4 Concentration 1% ~ 2%, H 2 Concentration of 15% to 18%, then increase the microwave power to 1200W to 1300W, maintain the gas pressure at 10000 to 13000Pa, and maintain the temperature of the ceramic valve core at 700 to 800°C for 4 to 5 hours. Finally, gradually reduce the microwave power and slowly lower the sample to room temperature.
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