N-type lateral insulated gate bipolar device capable of reducing hot carrier effect
A bipolar device and hot carrier technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems affecting the service life of devices, and achieve the effects of prolonging degradation life, reducing carrier temperature, and reducing dose
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[0024] Attached below figure 1 , the present invention is described in detail, a N-type lateral insulated gate bipolar device with reduced hot carrier effect, comprising: a P-type substrate 1, a buried oxygen 2 is arranged on the P-type substrate 1, and a buried oxygen 2 is provided with a P-type epitaxial layer 3, an N-type well 4 and a P-well region 13 are provided on the P-type epitaxial layer 3, an N-type buffer well 5 is provided on the N-type well 4, and an N-type buffer well 5 is provided on the N-type well 4. A P-type positive region 6 is provided, an N-type negative region 12 and a P-type body contact region 11 are provided on the P-well region 13, a gate oxide layer 10 is provided on the surface of the P-type epitaxial region 3, and the gate oxide layer 10 is formed from P The type epitaxial region 3 extends to the N-type well region 4, and a field oxide layer 8 is provided in the region other than the P-type anode region 6, the P-type body contact region 11, the N-...
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