Sputtering target for magnetic recording film and method for manufacturing such sputtering target

A manufacturing method and a technology of sputtering targets, which are applied in the field of sputtering targets, can solve problems such as density without specific research, and achieve the effects of high-speed film formation, easy acquisition, and high efficiency

Inactive Publication Date: 2010-09-15
MITSUI MINING & SMELTING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this target is made of alloy phase and ceramic phase that are finely divided and uniformly dispersed, and can reduce particles, the density of this target has not been studied in detail, and there is still room for improvement in magnetic permeability

Method used

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  • Sputtering target for magnetic recording film and method for manufacturing such sputtering target
  • Sputtering target for magnetic recording film and method for manufacturing such sputtering target
  • Sputtering target for magnetic recording film and method for manufacturing such sputtering target

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0101] By using an ultra-small gas atomization device (manufactured by Nisshin Technological Co., Ltd.), 50kg / cm was sprayed on 2kg of CoCr alloy at a bath temperature of 1650°C (measured with a radiation thermometer). 2 Argon (Ar) was used for gas atomization to obtain a powder. The obtained powder is a spherical powder with an average particle diameter of 150 μm or less.

[0102] Then, using the obtained powder, and TiO 2 The powder (average particle diameter: about 0.5 μm) was mechanically alloyed with a ball mill to obtain a powder (A).

[0103] In the obtained powder (A), the same powders as Pt powder (average particle size about 0.5 μm) and Co powder were added respectively, and Co 66 Cr 10 Pt 15 (TiO 2 ) 9 The composition ratio was mixed to obtain a powder (B). Mixed using a ball mill.

[0104] The obtained powder (B) was further sized using a vibrating sieve.

[0105] Next, the powder (B) was put into a molding die, and sintered under the following conditions ...

Embodiment 5～7

[0126] [Examples 5-7, Reference Examples 3-4]

[0127] Use SiO 2Powder (average particle size about 0.5μm) to replace TiO 2 The powder was mixed at the composition ratio shown in Table 1 to obtain powder (B), and a φ4-inch sputtering target was obtained in the same manner as in Example 1 except for the sintering conditions shown in Table 1. Table 1 shows various measurement results using these sintered bodies.

Embodiment 8～9

[0129] use it 2 o 5 Powder (average particle size about 0.5μm) to replace TiO 2 The powder was mixed at the composition ratio shown in Table 1 to obtain powder (B), and a φ4-inch sputtering target was obtained in the same manner as in Example 1 except for the sintering conditions shown in Table 1. Table 1 shows various measurement results using these sintered bodies.

[0130] [Table 1]

[0131]

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Abstract

Provided is a sputtering target for a magnetic recording film, by which film formation efficiency and film characteristics can be improved by suppressing growth of crystal grains, reducing magnetic permeability and increasing density. A method for manufacturing such sputtering target is also provided. The sputtering target is composed of a matrix phase, which includes Co and Pt, and a metal oxide phase. The sputtering target has a magnetic permeability of 6-15 and a relative density of 90% or more.

Description

technical field [0001] The present invention relates to a sputtering target used when forming a magnetic recording film and a manufacturing method thereof. More specifically, it is related with the sputtering target for magnetic recording films with low magnetic permeability and high density, and its manufacturing method. Background technique [0002] A hard disk device used as an external recording device needs to have high-density recording performance that can be used for high-performance computers, digital home appliances, and the like. In recent years, attention has been drawn to a perpendicular magnetic recording method that can sufficiently satisfy such high-density recording properties, and a Co-based alloy magnetic film is often used as a perpendicular magnetization film used in this method. It is well known that in these magnetic films, if the size and variation of crystal grains of each phase are suppressed and the magnetic interaction between the grains is reduc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34B22F1/00B22F3/00B22F3/10B22F3/14C22C1/04C22C1/05C22C19/07C22C32/00C23C14/06
CPCC22C30/00C22C32/0026C23C14/0688H01F41/183C22C5/04C23C14/3414C22C19/07C22C32/0021
Inventor 加藤和照
Owner MITSUI MINING & SMELTING CO LTD
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