Preparation method of solvent-free and high temperature-resistant adhesive
A high temperature resistant, adhesive technology, applied in the direction of adhesives, adhesive types, aldehyde/ketone condensation polymer adhesives, etc., can solve the problem of low high temperature strength of adhesives, and achieve excellent bonding strength Effect
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specific Embodiment approach 1
[0010] Specific embodiment 1: The preparation method of the solvent-free high-temperature resistant adhesive in this embodiment is as follows: 1. Mix 30-150 g of mixed organosilicon monomer and 10-70 g of water, and then react at 50-100 ° C for 1 h to 5 h. After the mixed solution is in a homogeneous phase, react at 80-130°C for 1h-3h to obtain the product, then add toluene, the amount of toluene added is 1 / 3 of the product mass, and the silicone resin is obtained; 2. Silicone resin, 3-70g of boron compound, 10-100g of phenolic compound, 10-130g of aldehyde and catalyst are reacted at 70-110°C for 1-6 hours, dehydrated to a viscosity of 1-50,000 centipoise, and borosilicate modified 3. Mix 100g of borosilicate modified phenolic resin, 10-120g of filler and 10-100g of polyimide to obtain a solvent-free high temperature resistant adhesive.
specific Embodiment approach 2
[0011] Specific embodiment 2: The difference between this embodiment and specific embodiment 1 is that the mixed organosilicon monomer described in step 1 is dimethyldiethoxysilane, methyltriethoxysilane, methylvinyldi Several of ethoxysilane, vinyltriethoxysilane, diphenyldiethoxysilane, methyltriacetoxysilane, tetraethoxysilane and dodecyltriethoxysilane combination. Others are the same as in the first embodiment.
[0012] When the mixed silicone monomer described in the present embodiment is a composition, the ratio of each component is arbitrary.
specific Embodiment approach 3
[0013] Specific embodiment three: the difference between this embodiment and specific embodiment one or two is that the boron compound described in step two is one of borax, boric acid, phenylboronic acid and p-bromophenylboronic acid or one of them Several compositions. Others are the same as those in the first or second embodiment.
[0014] When the boron-based compound described in this embodiment is a composition, the ratios between the components are arbitrary.
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