Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate

A cemented carbide substrate, nanostructure technology, applied in metal material coating process, coating, ion implantation plating and other directions, can solve problems such as difficult to meet the needs of modern industry

Inactive Publication Date: 2012-07-04
XIAMEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, TiN and ZrN coatings, which are representative of binary hard coatings, have been difficult to meet the needs of modern industry.

Method used

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  • Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate
  • Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate
  • Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] 1. Substrate pretreatment:

[0021] (1) Grinding and polishing: Carry out sufficient rough and fine grinding on the 600 mesh and 1200 mesh diamond grinding wheel discs of the cemented carbide substrate respectively. The time of coarse and fine grinding is controlled at about 10 minutes, the speed is 500r / min, coarse and fine grinding In between, the sample must be fully ultrasonically cleaned (ultrasonic cleaning time is 2min) and dried in an oven to remove abrasive debris and oil; after the sample is ground, it is polished with W2.5 diamond polishing powder. The polishing time is 10 minutes.

[0022] (2) Ultrasonic cleaning: The polished substrate is cleaned in the following order: acetone ultrasonic cleaning for 5 minutes → absolute ethanol ultrasonic cleaning for 5 minutes → drying for use.

[0023] (3) Ion source cleaning: Before sputtering deposition, first use Hall ion source to clean the substrate, the pressure of ion cleaning is 2×10 -2 Pa, substrate temperature 300℃,...

Embodiment 2

[0030] 1. Substrate pretreatment: the same as in Example 1.

[0031] 2. Pre-sputtering: the same as in Example 1.

[0032] 3. Sputtering deposition: After pre-sputtering, argon and nitrogen are introduced, the total flux is 60sccm, the nitrogen flow rate is 20%, the deposition working pressure is 0.3Pa, the DC power supply of the Zr target is 250W, Y The radio frequency power of the target material is 100W, the sputtering time is 90min, and the substrate temperature is 300°C. After the deposition is completed, the sample is taken out and stored in a desiccator for characterization and analysis. After the deposition is completed, the sample is taken out and stored in a desiccator for characterization and analysis.

[0033] image 3 The XRD pattern of the coating shows that the prepared coating has a face-centered cubic structure. The coating crystal grain size test method is the same as in Example 1, and the coating crystal grain size is calculated to be 17 nm.

[0034] 4. The chemi...

Embodiment 3

[0037] 1. Substrate pretreatment: (1) Grinding and polishing: the same as in Example 1. (2) Ultrasonic cleaning: same as Example 1. (3) Ion source cleaning: same as Example 1.

[0038] 2. Pre-sputtering: the same as in Example 1.

[0039] 3. Sputtering deposition: After pre-sputtering, argon and nitrogen are introduced, the total flux is 60sccm, the nitrogen flow rate is 15%, the deposition working pressure is 0.4Pa, and the DC power supply of the Zr target is 250W, Y The target's radio frequency power supply power is 150W, the sputtering time is 90min, and the substrate temperature is 300°C. After the deposition is completed, the sample is taken out and stored in a desiccator for characterization and analysis. After the deposition is completed, the sample is taken out and stored in a desiccator for characterization and analysis.

[0040] Figure 4 The XRD pattern of the coating indicates that the prepared coating has a face-centered cubic structure. The coating crystal grain si...

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Abstract

The invention discloses a method for preparing a nitrogen-yttrium-zirconium hard coating with a nano structure on the surface of a hard alloy substrate, which relates to a hard alloy, in particular to a method for preparing the nitrogen-yttrium-zirconium hard coating with the nano structure on the surface of the hard alloy substrate by using a magnetron sputtering process. In the method, the nitrogen-yttrium-zirconium hard coating with a nano composite structure and high hardness is formed by sputtering and deposition on the surface of the hard alloy substrate which is polished mechanically, washed ultrasonically and washed by an ion source, wherein the sputtering and deposition are direct-current and radio-frequency reactive co-sputtering and deposition, the control total pressure is 0.3to 0.5Pa, the nitrogen flow rate is 15 to 20 percent, the Zr target direct current power is 250 W, the radio frequency power supply power of a Y target is 50 to 200W, the temperature of the substrateis 300 DEG C, and the deposition time is 90 minutes.

Description

Technical field [0001] The invention relates to a hard alloy, in particular to a method for preparing a nano-structured yttrium oxynitride and zirconium hard coating on the surface of a hard alloy substrate. Background technique [0002] With the popularization of CNC machine tools and machining centers, high-efficiency, high-speed and high-precision cutting has become the main development direction of modern machining technology, and higher requirements for the performance of cutting tools are correspondingly put forward. Coating the tool is one of the important ways to improve the performance of the tool. By selecting suitable coating materials and coating preparation methods, the hardness, wear resistance and high temperature oxidation performance of the tool can be improved, thereby increasing the service life of the tool. Among these coated tools, the nitride coating of transition group elements has been widely used in the past two decades because of its high hardness, exce...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/34
Inventor 王周成祁正兵黄若轩孙鹏朱芳萍
Owner XIAMEN UNIV
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