Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate

A cemented carbide substrate and nanostructure technology, which is applied in the direction of metal material coating process, coating, ion implantation plating, etc., can solve the problems that are difficult to meet the needs of modern industry

Inactive Publication Date: 2010-12-29
XIAMEN UNIV
View PDF4 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, TiN and ZrN coatings, which are representative of binary hard coatings, have been difficult to meet the needs of modern industry.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate
  • Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate
  • Method for preparing nitrogen-yttrium-zirconium hard coating with nano structure on surface of hard alloy substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] 1. Substrate pretreatment:

[0021] (1) Grinding and polishing: Carry out sufficient rough grinding and fine grinding of the cemented carbide substrate on 600 mesh and 1200 mesh diamond grinding wheel discs respectively. The sample must be fully ultrasonically cleaned (ultrasonic cleaning time is 2min) and dried in an oven to remove wear debris and oil stains; after the sample is ground, it is polished with W2.5 diamond polishing powder. The polishing time is 10min.

[0022] (2) Ultrasonic cleaning: Clean the polished substrate in the following order, ultrasonic cleaning with acetone for 5 minutes → ultrasonic cleaning with absolute ethanol for 5 minutes → drying for later use.

[0023] (3) Ion source cleaning: Before sputtering deposition, the Hall ion source is used to clean the substrate, and the pressure of ion cleaning is 2×10 -2 Pa, substrate temperature 300°C, argon flux 10sccm, bias voltage negative 100V, cathode current voltage 29.5A, 19V, anode current volta...

Embodiment 2

[0030] 1. Substrate pretreatment: same as embodiment 1.

[0031] 2. Pre-sputtering: same as embodiment 1.

[0032] 3. Sputtering deposition: After the pre-sputtering, argon and nitrogen are introduced, the total flux is 60sccm, of which the nitrogen flow rate is 20%, the working pressure of the deposition is 0.3Pa, the DC power supply of the Zr target is 250W, Y The RF power of the target is 100W, the sputtering time is 90min, and the substrate temperature is 300°C. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis.

[0033] image 3 It is the XRD spectrum of the coating, which shows that the prepared coating has a face-centered cubic structure. The coating grain size test method is the same as in Example 1, and the coating grain size is calculated to be 17nm.

[0034] 4. The ...

Embodiment 3

[0037] 1. Substrate pretreatment: (1) Grinding and polishing: Same as Example 1. (2) ultrasonic cleaning: with embodiment 1. (3) Ion source cleaning: Same as in Example 1.

[0038] 2. Pre-sputtering: same as embodiment 1.

[0039] 3. Sputtering deposition: After the pre-sputtering, argon and nitrogen are introduced, the total flux is 60sccm, of which the nitrogen flow rate is 15%, the working pressure of the deposition is 0.4Pa, the DC power of the Zr target is 250W, Y The RF power of the target is 150W, the sputtering time is 90min, and the substrate temperature is 300°C. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis. After the deposition is complete, the sample is taken out and stored in a desiccator, pending characterization and analysis.

[0040] Figure 4 It is the XRD spectrum of the coating, indicating that the prepared coating is a coating with a face-centered cubic structure. The coati...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
hardnessaaaaaaaaaa
particle sizeaaaaaaaaaa
Login to view more

Abstract

The invention discloses a method for preparing a nitrogen-yttrium-zirconium hard coating with a nano structure on the surface of a hard alloy substrate, which relates to a hard alloy, in particular to a method for preparing the nitrogen-yttrium-zirconium hard coating with the nano structure on the surface of the hard alloy substrate by using a magnetron sputtering process. In the method, the nitrogen-yttrium-zirconium hard coating with a nano composite structure and high hardness is formed by sputtering and deposition on the surface of the hard alloy substrate which is polished mechanically, washed ultrasonically and washed by an ion source, wherein the sputtering and deposition are direct-current and radio-frequency reactive co-sputtering and deposition, the control total pressure is 0.3 to 0.5Pa, the nitrogen flow rate is 15 to 20 percent, the Zr target direct current power is 250 W, the radio frequency power supply power of a Y target is 50 to 200W, the temperature of the substrate is 300 DEG C, and the deposition time is 90 minutes.

Description

technical field [0001] The invention relates to a hard alloy, in particular to a method for preparing a nanostructure yttrium zirconium nitride hard coating on the surface of a hard alloy substrate. Background technique [0002] With the popularization of CNC machine tools and machining centers, high-efficiency, high-speed and high-precision cutting has become the main development direction of modern processing technology, and higher requirements are put forward for the performance of cutting tools. Coating the tool is one of the important ways to improve the performance of the tool. By selecting a suitable coating material and coating preparation method, the hardness, wear resistance and high temperature oxidation performance of the tool can be improved, thereby increasing the service life of the tool. Among these coated tools, nitride coatings of transition group elements have been widely used in the past two decades due to their high hardness, excellent wear resistance a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34
Inventor 王周成祁正兵黄若轩孙鹏朱芳萍
Owner XIAMEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap