Preparation method of ceramic-glass polishing solution

Abstract

The invention relates to a preparation method of a ceramic-glass polishing solution. According to a principle that ceramic glass can chemically react with alkali, an alkaline polishing solution, i.e. a nano abrasive material of SiO2 with the concentration of 4-50 percent by weight and the grain diameter of 15-45 nm, is selected as the polishing solution to favorably remove the material and level the surface. The polishing solution has a pH value of 9-13 to not only satisfy the effective removal, but also ensure the stability of silica sol. The preparation process adopts a negative pressure stirring preparation method, avoids the pollution of organic matters, great granules, metal ions, and the like, which are brought by traditional preparation methods of compounding, mechanical stirring, and the like, can reach the ultra-clean requirement and realize that the nano abrasive material of SiO2 is prevented from being agglomerated or dissolved under conditions of high concentration and high pH value. The preparation method of the polishing solution can be utilized to realize the high-accuracy processing of the ceramic-glass surface, meet the requirement for industrially and accurately polishing and processing the ceramic glass, obviously improve the device performance and improve the yield. The method has the advantages of simple operation, low cost, low roughness and high velocity without pollution.

Description

technical field [0001] The invention relates to a method for preparing a polishing liquid, in particular to a method for preparing a polishing liquid for glass-ceramics. Background technique [0002] At present, glass-ceramic is a kind of basic material used in the fields of electronics, microelectronics, and optoelectronics. It is mainly used in the second generation of computer hard disks and components with functions such as optoelectronics, thermoelectrics, acousto-optic, and magneto-optical. Basic material for inertial navigation, guidance and control optical components. The research of glass-ceramic is a key project of national defense. Due to the particularity of its application field, the surface roughness of glass-ceramic is required to be less than 0.1 nm, and there are strict requirements on surface morphology, defects and cleanliness. At present, military and high-quality optical components are polished with asphalt, but it is difficult to clean due to the compl...

AI Technical Summary

Problems solved by technology

At present, military and high-quality optical components are polished with asphalt, but it is difficult to clean due to the complex pollution of asphalt components; and CeO 2 、Al 2 o 3 Abrasives are used for grinding. The abrasives are generally made by crushing process, and there are uneven particles. The use of this abrasive also has problems such as serious pollution, difficult cleaning, and cumbersome procedures.

[0003] The above problems existing in the polishing of glass-ceramic have become the obstacle that glass-ceramic is widely used. In order to improve the polishing rate, some companies in the United States such as Cabot, Rodel and other companies use large particle size abrasives (about 130nm), but this method is also At the same time, problems such as surface scratches, residual particles that are difficult to clean, poor fluidity of polishing slurry, and easy precipitation have occurred.

[0004] In short, there are a large number of harmful pollutions such as organic matter, metal ions, large particles, etc. in the preparation process of polishing fluid for glass-ceramics, and the process is cumbersome.