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Developing solution as well as preparation method and application thereof

A developing solution and compound technology, applied in the field of developing solution and its preparation, can solve the problems of reducing the yield rate of panel production lines, affecting the display quality of flat panel display images, etc., and achieve the effects of wide operating temperature range, less environmental pollution, and good developing performance.

Active Publication Date: 2011-06-15
HEFEI MAOTENG ENVIRONMENTAL PROTECTION TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If a high-precision photoresist image cannot be obtained, it will directly affect the display quality of the flat panel display image and reduce the yield rate of the panel production line

Method used

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  • Developing solution as well as preparation method and application thereof
  • Developing solution as well as preparation method and application thereof
  • Developing solution as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] Will be by the nonionic surfactant coconut oil fatty acid monoethanolamide (commercial name CMEA) shown in 0.5 weight part formula I and 1.5 weight part nonionic surfactant castor oil polyoxyethylene (10) ether (trade name EL-10) With 3.0 parts by weight of tetramethylammonium hydroxide added to 95.0 parts by weight of the total metal ion concentration is 400 × 10 -9 g / g of deionized water was stirred evenly at room temperature to obtain the developer solution 1 provided by the present invention.

Embodiment 2-18

[0043] Embodiment 2-18 (S2-S20)

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Abstract

The invention discloses a developing solution as well as a preparation method and application thereof. The developing solution comprises the following components in percentage by weight: 1-15% of an alkaline compound, 0.5-6% of a non-ionic surface active agent and the balance of water, wherein the alkaline compound is preferably selected from at least one of tetramethylammonium hydroxide, tetraethyl ammonium hydroxide and tetrapropylammonium hydroxide. The non-ionic surface active agent is selected from at least one of coconut monoethanol amide, cocoanut fatty acid diethanolamide, polyoxyethylene castor oil (10) ether and polyoxyethylene castor oil (30) ether. In the developing solution provided by the invention, the water solution formed by the alkaline compound and the non-ionic surfaceactive agent has good intersolubility, the developing solution has the characteristics that the developing performance is good, no residue is left, the operating temperature range is wide, and the environmental pollution is less and the like, and has wide application in a development preparation process of photosensitive resin.

Description

technical field [0001] The invention relates to a developing solution and a preparation method and application thereof. Background technique [0002] In the field of flat panel display, including plasma display (PDP), liquid crystal display (LCD) and organic electroluminescence (OLED) and other preparation processes, in order to obtain various fine images required, it is necessary to use photoresist (Photo Resistor) is coated on the substrate to form a thin film, then shielded with a mask and exposed, and then developed with an alkaline developer to remove the unexposed part to obtain the desired image. [0003] Commonly used photoresists are alkali-soluble resins, such as phenolic resins, acrylic resins, and poly(p-hydroxystyrene), which are usually irradiated with ultraviolet light to change the molecular structure of the polymer resin and its solubility in alkali substances, so as to be able to Soluble in alkaline developer. Alkaline compounds used in alkaline developer...

Claims

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Application Information

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IPC IPC(8): G03F7/32G03F7/004
Inventor 冯卫文
Owner HEFEI MAOTENG ENVIRONMENTAL PROTECTION TECH CO LTD
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