Method for improving electroplating quality of front electrode of solar cell

A technology of solar cells and front electrodes, which is applied in the field of solar cells, can solve problems affecting the appearance quality of cells, poor compactness of dielectric films, and decreased cell efficiency, so as to solve problems such as poor adhesion, good compactness, and reduced surface composite effect

Active Publication Date: 2011-10-19
浙江晶科新材料有限公司
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  • Description
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Problems solved by technology

The position without laser slotting has low activity due to the passivation effect of the dielectric film, and will not be plated with metal
[0005] However, in the process of electroplating electrodes, due to the poor density of the dielectric film and defects such as pinholes, the non-grid line posit

Method used

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  • Method for improving electroplating quality of front electrode of solar cell
  • Method for improving electroplating quality of front electrode of solar cell
  • Method for improving electroplating quality of front electrode of solar cell

Examples

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Embodiment 1

[0031] Such as figure 2 , image 3 As shown, the P-type silicon substrate 3 was cleaned and textured by the conventional process, and POCl was diffused at 850 °C 3 The liquid source was used for 25 minutes to obtain an N-type emitter 4 of about 50Ω / □. Edge isolation and PSG removal using wet chemical methods. After depositing a layer of SiNx film of about 90nm on the emitter by PECVD method as the dielectric film 1, screen-print aluminum paste and silver-aluminum paste on the side of the silicon substrate 3 without the dielectric film 1 as the back electric field 2 and the back electrode respectively, and then use The silver paste is screen-printed on the dielectric film 1 with a special screen plate with only the positive electrode of the busbar, and the width of the positive electrode of the busbar is 1.5 mm. The silicon substrate 3 that has completed the silk-screen printing process is passed into a sintering furnace for sintering at a temperature between 300°C and 900°...

Embodiment 2

[0033] Such as figure 2 , Figure 4 As shown, the P-type silicon substrate 3 is cleaned and textured by the conventional process, and then diffused with POCl at 830 °C 3 The liquid source was used for 25 minutes to obtain an N-type emitter 4 of about 100Ω / □. Edge isolation and PSG removal using wet chemical methods. After depositing a layer of SiNx film of about 90nm on the emitter by PECVD method as the dielectric film 1, screen-print aluminum paste and silver-aluminum paste on the side of the silicon substrate 3 without the dielectric film 1 as the back electric field 2 and the back electrode respectively, and then use The silver paste is screen-printed on the dielectric film 1 with a special screen plate with only the positive electrode of the busbar, and the width of the positive electrode of the busbar is 1.5 mm. The silicon substrate 3 that has completed the silk-screen printing process is passed into a sintering furnace for sintering at a temperature between 300°C a...

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Abstract

The invention relates to a method for improving the electroplating quality of a front electrode of a solar cell, comprising the following steps: pretreatment, sintering, laser scanning and slotting as well as electroplating, wherein a step of prefabricating a positive electrode of a main grid line by using a silk-screen printing mode exists between the pretreatment step and the sintering step; the step of the laser scanning of the slotting is to use lasers to scan a fine grid and slot; and the electroplating step comprises the following steps: electroplating a semi-finished cell on which fine grid scanning and slotting is finished by lasers; using an HF (hydrogen fluoride) acid solution with a low concentration or a mixed solution of HF and NH4F (ammonium fluoride) to activate a surface of the semi-finished cell; placing the semi-finished cell in a chemical nickel-plating bath; depositing nickel with the thickness of 0.1-1.0mu m on the front face of the fine grid; placing in an electrosilvering bath; depositing silver with the thickness of 2-20mu m; and annealing to form nickel-silicon alloys, thus finishing the fabrication of the front electrode of the cell. In the method, the silk-screen printing is utilized to prefabricate the positive electrode of the main grid line, thus optimizing the distribution of power lines on the cell surface, thereby improving a cell-scraping phenomenon caused by poor quality of dielectric films in the electroplating process and solving the problem that the adhesive force of a main grid line of the solar cell electrode fabricated by using a single electroplating method is poor.

Description

technical field [0001] The invention belongs to the technical field of solar cells, in particular relates to a method for preparing a front electrode of a solar cell, and more particularly relates to a method for improving the electroplating quality of a front electrode of a solar cell so as to improve the "bloom" phenomenon in the electroplating process. Background technique [0002] With the further depletion of traditional energy sources such as oil and coal, more and more countries have begun to seek solutions to energy shortages through photovoltaic power generation technology. However, the relatively high cost of photovoltaic power generation restricts the widespread promotion of this technology. There are currently many research institutions and companies working on ways to reduce battery costs by improving battery efficiency. [0003] Among the many methods to improve battery efficiency, the improved method of making the front electrode of the battery is an importan...

Claims

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Application Information

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IPC IPC(8): H01L31/18H01L31/0224H01L21/288C25D7/12
CPCY02P70/50
Inventor 廖明墩查超麟
Owner 浙江晶科新材料有限公司
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