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Anti-reflection coating of crystalline silicon solar cell and preparation method thereof

A technology of crystalline silicon solar cells and anti-reflection films, which is applied in the manufacturing of circuits, electrical components, and final products, etc., can solve the problems of poor hydrogen passivation effect of anti-reflection films, unable to meet the needs of solar cells, and poor anti-reflection effect, etc. Achieve the effect of clear industrialization prospects, easy operation and realization, and easy mastery

Active Publication Date: 2011-11-16
XIAN HUANGHE PHOTOVOLTAIC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In industrial production, generally only a layer of Si with a single refractive index is made on the surface of the silicon wafer. x N y It has a good anti-reflection effect on light within a certain wavelength range, but slightly less anti-reflection effect on other wavelengths of light
Combining the spectral response and solar spectral characteristics of silicon materials, crystalline silicon Si x N y The anti-reflection coating needs to be in the range of 350-1050nm to have the best anti-reflection effect, and it is only for a single refractive index Si within a certain wavelength range. x N y film, which can no longer meet the needs of reducing production costs and improving the efficiency of crystalline silicon solar cells, research on graded-index Si x N y Anti-reflection coating system is an effective way to solve this problem
At present, most papers have studied double-layer, triple-layer and multi-layer anti-reflection coatings, such as "Design and Analysis of Anti-reflection Coatings for Solar Cells", "Research on Double-layer Anti-reflection Coatings for PESC Solar Cells", etc. Si x N y However, the hydrogen passivation effect of the anti-reflection film prepared by this method is poor, and it can no longer meet the needs of current solar cells.

Method used

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  • Anti-reflection coating of crystalline silicon solar cell and preparation method thereof
  • Anti-reflection coating of crystalline silicon solar cell and preparation method thereof
  • Anti-reflection coating of crystalline silicon solar cell and preparation method thereof

Examples

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preparation example Construction

[0019] The preparation method of the novel crystalline silicon solar cell anti-reflection film with constantly changing refractive index of the present invention comprises the following steps:

[0020] (1) Using a graphite boat to carry monocrystalline / polycrystalline silicon wafers, the temperature is 450°C, the single crystal power is 4100Watt, the polycrystalline power is 6000Watt, the RF duty ratio is 5:55, the pressure is 1500mTorr, and silane and ammonia gas are introduced Coatings deposited by glow discharge.

[0021] The silane flow decreases with the glow time, the ammonia flow increases with the glow discharge time, the ratio of silane to ammonia decreases from 1:3 to 1:15, and the mass flow control is adjusted by computer during the glow discharge time The device reduces the silane flow rate from 1600ml / min to 453ml / min at a constant speed, and the ammonia flow rate increases from 4800ml / min to 6800ml / min at a constant speed. The total flow difference during the glo...

example 1

[0026] 1. Before the production of the anti-reflection film, according to the conventional production process of monocrystalline silicon solar cells, that is, cleaning→diffusion→etching→phosphorus washing→PE→printing→sintering, the monocrystalline silicon wafer with a resistivity of 1-3Ω·cm is washed After phosphorous, prepare for coating.

[0027] 2. A graphite boat is used to carry a single crystal silicon wafer, the temperature is 450°C, the power is 4100Watt, the radio frequency duty ratio is 5:55, the pressure is 1500mTorr, and the coating is deposited by glow discharge under the condition of feeding silane and ammonia gas.

[0028] The silane flow decreases with the glow time, the ammonia flow increases with the glow discharge time, the ratio of silane to ammonia decreases from 1:3 to 1:15, and the mass flow control is adjusted by computer during the glow discharge time The device reduces the silane flow rate from 1600ml / min to 453ml / min at a constant speed, and the ammo...

example 2

[0036] 1. Before making the anti-reflection film, according to the conventional production process of polycrystalline silicon solar cells, that is, cleaning→diffusion→etching→phosphorus washing→PE→printing→sintering. coating.

[0037] 2. Use a graphite boat to carry the polysilicon wafer. The temperature is 450°C, the power is 6000Watt, the radio frequency duty ratio is 5:55, the pressure is 1500mTorr, and the film is deposited by glow discharge under the condition of feeding silane and ammonia gas.

[0038] The silane flow decreases with the glow time, the ammonia flow increases with the glow discharge time, the ratio of silane to ammonia decreases from 1:3 to 1:15, and the mass flow control is adjusted by computer during the glow discharge time The device reduces the silane flow rate from 1600ml / min to 453ml / min at a constant speed, and the ammonia flow rate increases from 4800ml / min to 6800ml / min at a constant speed. The total flow difference during the glow process is less...

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Abstract

The invention discloses an anti-reflection coating of a crystalline silicon solar cell and a preparation method for the anti-reflection coating. The refraction index is increased from top to bottom at equal rate, wherein the minimum refraction index is 1.95, and the maximum refraction index is 2.45. The preparation method comprises the following steps of: bearing monocrystal or polycrystalline silicon by using graphite boat; depositing the coating through glow discharge under the condition that silane and ammonia gas are introduced; and annealing after the glow discharge is finished, wherein the silane flow continuously decreases with the glow time and the ammonia gas flow continuously increases with glow time. The anti-reflection coating of the crystalline silicon solar cell has better anti-reflection effect, the generation quantity of photon-generated carriers is increased, additional equipment or device is not needed, and the method is simple and easy to master, and has the characteristics of convenience for operation, repetition and reliability.

Description

technical field [0001] The invention relates to the preparation of a solar cell anti-reflection film, belonging to the field of solar cell device preparation. Background technique [0002] Crystalline silicon solar cells are a clean, non-polluting green energy source that converts light energy into electrical energy through solar radiation, and the production of anti-reflective coatings is a key factor affecting their photoelectric conversion efficiency. In industrial production, generally only a layer of Si with a single refractive index is made on the surface of the silicon wafer. x N y The film has a good anti-reflection effect on light within a certain wavelength range, but has a slightly poor anti-reflection effect on light at other wavelengths. Combining the spectral response and solar spectral characteristics of silicon materials, crystalline silicon Si x N y The anti-reflection coating needs to be in the range of 350-1050nm to have the best anti-reflection effect...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0216H01L31/18
CPCY02P70/50
Inventor 巨小宝刘洪波王宝磊李楷张祥豆维江
Owner XIAN HUANGHE PHOTOVOLTAIC TECH
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