A manufacturing process of a microfluidic channel with heating function
A microfluidic channel and manufacturing process technology, applied in the field of micro-nano, can solve problems such as uncontrollable ultrasonic energy, harmful noise sources of devices, and failure to meet requirements, etc., and achieve good biocompatibility, chemical analysis auxiliary functions, and strong operability , promote the effect of thorough mixing and analysis
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Embodiment 1
[0032] Embodiment 1-Preparation of nano wire structure by wet etching
[0033] A manufacturing process of a microfluidic channel with a heating function, comprising the following steps:
[0034] 1) Put the transparent quartz glass substrate 1 in concentrated H with a volume ratio of 7:3 2 SO 4 and H 2 o 2 The mixture was placed in a water bath at 90°C for 30 minutes, washed with acetone and IPA first, ultrasonicated at 45°C for 15 minutes with acetone, 15 minutes with IPA at room temperature, then washed with deionized water for 10 minutes, and then dried at 150°C or higher.
[0035] 2) Prepare a layer of SU-8 photoresist 2 on the surface of the transparent quartz glass substrate 1 by spraying or spin coating, the thickness of the SU-8 photoresist 2 is 1-100um, and then pre-baking, at 65 Bake at -95°C for 10 minutes,
[0036] 3) Refer to Picture 1-1 , 365nm ultraviolet exposure 4 was carried out on the transparent quartz glass substrate prepared with SU-8 photoresist, a...
Embodiment 2
[0039] Embodiment 2-Using Lift-off to prepare nano wire structure
[0040] A manufacturing process of a microfluidic channel with a heating function, comprising the following steps:
[0041] 1) Put the transparent quartz glass substrate 1 in concentrated H with a volume ratio of 7:3 2 SO 4 and H 2 o 2 The mixture was placed in a water bath at 90°C for 30 minutes, washed with acetone and IPA first, ultrasonicated at 45°C for 15 minutes with acetone, 15 minutes with IPA at room temperature, washed with deionized water for 10 minutes, dried with nitrogen, and then dried at 150°C or higher.
[0042] 2) Prepare a layer of SU-8 photoresist 2 on the surface of the transparent quartz glass substrate 1 by spraying or spin coating, the thickness of the SU-8 photoresist 2 is 1-100um, and then pre-baking, at 65 Bake at -95°C for 10 minutes,
[0043] 3) Refer to Figure 1-2 , the transparent quartz glass substrate 1 prepared with SU-8 photoresist 2 is subjected to 365nm ultraviolet lig...
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