Flash memory unit sharing source line and method for forming the same
A flash memory cell and source line technology, applied in electrical components, electrical solid devices, circuits, etc., can solve the problems of low programming efficiency of flash memory cells, and achieve the effects of improving stress reliability, good programming performance, and improving coupling coefficient.
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[0038] It can be known from the background art that when the device is scaled down, the performance of the existing flash memory unit sharing the source line is not good enough, and the programming efficiency is relatively low.
[0039] Please refer to figure 1 When programming the existing flash memory cells sharing the source line, the voltage applied to the source line 170 is coupled to the floating gate 120 through the spacer dielectric layer 180, and hot electrons migrate from the drain 101 to the source 102 under the action of the coupling voltage , and is injected into the floating gate 120 during the migration process. In order to ensure the data retention capability of the floating gate 120, the sidewall dielectric layer 180 must have no defects. Due to the limitation of the deposition process, if the thickness of the sidewall dielectric layer 180 is too small, some defects are prone to occur, such as defects such as voids formed in the film. Therefore, the thickness...
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