Preparation method of dye sensitization battery auxiliary electrode
A dye-sensitized battery and auxiliary electrode technology, applied in the field of solar cells, can solve the problem of not completely solving the problem of electrolyte corrosion of auxiliary electrodes, and achieve the effects of ensuring long-term stability, ensuring flatness, and reducing production costs
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Embodiment 1
[0014] After cleaning the glass substrate with detergent and deionized water ultrasonically and blowing it dry, print a layer of 15 μm photosensitive adhesive against glass corrosion solution on the glass substrate, dry it at 60°C for 25 minutes, and expose it through a mask. Exposure is 600mJ / cm 2 , and then develop for 60s with a sodium carbonate developer solution with a mass percentage concentration of 0.2% at a temperature of 30°C, rinse repeatedly with deionized water for 10 minutes, and dry at 80°C for 10 minutes, covering the part of the glass substrate that does not need to be etched A layer of photosensitive glue.
[0015] Use a mixture of hydrofluoric acid and pure water with a mass percentage concentration of 40% and a mass ratio of 1:4 to etch the glass substrate at room temperature for 8 seconds, take it out and rinse it repeatedly with deionized water for 10 minutes, and then remove the glass substrate. The substrate was placed in a sodium hydroxide stripping s...
Embodiment 2
[0019] After cleaning the glass substrate with detergent and deionized water ultrasonically and drying it, print a layer of 45m thick photosensitive adhesive against glass corrosion solution on the glass substrate, dry it at 100°C for 20min, and expose it through a mask. Exposure is 800mJ / cm 2 , and then develop with 0.6% sodium carbonate developer at a temperature of 40°C for 20s, rinse with deionized water repeatedly for 10 minutes, and dry at 100°C for 10 minutes. A layer of photosensitive glue.
[0020] Use a mixture of hydrofluoric acid and pure water with a mass percentage concentration of 40% and a mass ratio of 1:4 to etch the glass substrate at room temperature for 30 seconds, take it out and rinse it repeatedly with deionized water for 10 minutes, and then remove the glass substrate. Put the substrate into a sodium hydroxide film stripping solution with a temperature of 55°C and a concentration of 0.6% by mass to react for 60 seconds, take it out and rinse it with d...
Embodiment 3
[0024] After cleaning the glass substrate with detergent and deionized water ultrasonically and drying it, print a layer of 30 μm photosensitive adhesive against glass corrosion solution on the glass substrate, dry it at 80°C for 20 minutes, and expose it through a mask. Exposure is 650mJ / cm 2 , and then develop for 40s with a sodium carbonate developer solution with a mass percentage concentration of 0.4% at a temperature of 35°C, rinse repeatedly with deionized water for 10 minutes, and dry at 80°C for 10 minutes. Cover the part of the glass substrate that does not need to be etched A layer of photosensitive glue.
[0025] Use a mixture of hydrofluoric acid and pure water with a mass percentage concentration of 40% and a mass ratio of 1:4 to etch the glass substrate at room temperature for 20 seconds, take it out and rinse it repeatedly with deionized water for 10 minutes, and then remove the glass substrate. Put the substrate into a sodium hydroxide film stripping solution...
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