Physical purification method and device of metallic silicon
A physical purification, metal silicon technology, applied in the direction of silicon compounds, non-metallic elements, chemical instruments and methods, etc., can solve the problems of limited treatment effect, restricted material transportation, low ion density, etc., to achieve low cost, high energy, The effect of high ion density
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Embodiment 1
[0051] In this embodiment, the background vacuum of the system is first evacuated to 1mTorr, and then the carrier gas (Ar:H 2 : HCl=98:1:1), the gas preheating temperature is 900°C. Adjust the pressure to normal pressure, and then apply a sinusoidal AC power supply with a voltage of 4kV and a frequency of 10kHz to the system. After the discharge is stable, the silicon material to be treated is filled into the system through the feed system 1 along with the carrier gas. In the embodiment, the silicon material powder will be heated to 900° C. along with the carrier gas, so as to facilitate the progress of solid phase diffusion in the particles. The average particle size of the particles is 50 μm. The average residence time of particles in the device is 1h, and multi-stage purification or repeated purification can be implemented according to the condition of the silicon material itself.
Embodiment 2
[0053] This embodiment is under relatively low degree of vacuum (10 4 Pa) To implement the experimental scheme, it is necessary to further refine the particle size of the silicon material (1 μm), otherwise the average processing time will be shortened accordingly. Other parameters are similar to Example 1.
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Abstract
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