Transmittance measurement device, transmittance inspection device for photomask, transmittance inspection method

Abstract

PROBLEM TO BE SOLVED: To provide a transmittance measuring instrument capable of accurately measuring the film transmittance of a fine pattern (e.g., a fine light-semitransmitting film pattern formed on a transparent substrate).SOLUTION: In measuring the film transmittance of a fine pattern and the like of a light-semitransmitting film formed on a transparent substrate, light of a measurement wavelength is converged on the light-semitransmitting film to be a measurement object so as to be the smallest diameter (beam waist) and transmitted, and the whole transmitted light is subsequently collected in an integrating sphere and is detected by a detector.

Description

technical field [0001] The present invention relates to a transmittance measuring device, for example, to a transmittance measuring device for measuring the light transmittance of fine parts such as a photomask having a transfer pattern formed by processing an optical film formed on a transparent substrate. Background technique [0002] Currently, photolithography is used in the manufacture of electronic devices such as liquid crystal devices. That is, a photomask having a predetermined transfer pattern is used to expose a resist film formed on an etched to-be-processed layer (hereinafter also referred to as a transfer object) under predetermined exposure conditions, and transfer The transferred pattern images the resist film to form a resist pattern. Then, a step of etching the transfer target body using the resist pattern as a mask is performed. [0003] In recent years, in the manufacture of electronic devices such as liquid crystal display devices, cost reduction has b...

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Problems solved by technology

Therefore, if the line width of the part to be measured is less than 5mm, the reliability of the measured value will be lowered due to the influence of the surrounding transmittance.

Therefore, there is a problem that reliable transmittance cannot be measured in a measurement area (such as a fine semi-transparent part) with a line width of the order of μm.

[0007] Regarding the above method (2), although it is possible to measure the transmittance of a small measurement area, it needs to be converted into a desired wavelength after the visible light measurement, so it is relatively difficult to grasp the spectral characteristics of the film formed on the semi-transparent part in advance. It is complicated, and errors may occur depending on the film characteristics, etc., and there is a problem that it is difficult to measure the correct transmittance with reliability

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