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Rotary exchanging method and rotary exchanging device for double workpiece platforms based on synchronous steering of turntable gear

A technology of double workpiece table and workpiece table, which is applied in the direction of exposure device, electrical components, conveyor objects, etc. in the photolithography process, can solve the problems of shortening the balance time, loss of laser interferometer target, small moment of inertia, etc. The effect of engraving machine productivity, shortening balance time, and improving operating efficiency

Inactive Publication Date: 2012-06-20
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the present invention, the double-table rotation is switched to three beats, and the workpiece table does not spin during the table-changing process, which solves the problems of phase inversion of the workpiece table, cable entanglement, laser interferometer target loss, etc.
At the same time, the present invention adopts the platform changing method that the workpiece table rotates around the center of the abutment, avoids rotating the whole abutment, and solves the problems of large radius of gyration and large moment of inertia in the prior art, and the moment of inertia is small. Shorter times improve workbench operating efficiency and lithography machine productivity
The present invention also solves the problems of large impact torque and many beats in the existing linear channel change scheme, and can adopt a smaller mass balance system, which is beneficial to shorten the balance time, simplify the system at the same time, reduce costs, and shorten the cycle time of channel change. It takes less time to change the platform, which can effectively improve the productivity of the lithography machine

Method used

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  • Rotary exchanging method and rotary exchanging device for double workpiece platforms based on synchronous steering of turntable gear
  • Rotary exchanging method and rotary exchanging device for double workpiece platforms based on synchronous steering of turntable gear
  • Rotary exchanging method and rotary exchanging device for double workpiece platforms based on synchronous steering of turntable gear

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Embodiment Construction

[0025] The present invention will be further described in detail below in conjunction with the drawings:

[0026] A double-workpiece table rotation exchange method based on the synchronous direction adjustment of the turntable gears, the method includes the following steps:

[0027] The initial working state of the system is that the pre-alignment of the second workpiece stage of the pretreatment station is completed, and the first workpiece stage of the exposure station completes the exposure work;

[0028] In the first step, the first workpiece stage after exposure is driven by the Y-direction long-stroke linear motion unit and the X-direction first long-stroke motion unit to the predetermined position for the stage change, and then the first shaft connection device installed on the return stage device is lifted. And connect with the rotation axis of the first work table at the bottom of the first work table. At the same time, the second shaft connection device is connected with th...

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Abstract

The invention discloses a rotary exchanging method and a rotary exchanging device for double workpiece platforms based on synchronous steering of a turntable gear and belongs to semiconductor manufacturing equipment. The device comprises a rotary platform switching device consisting of a rotary motor stator, a rotary motor rotor, a rotating platform embedded in a base station and a rotary platform switching gear, wherein a liftable first shaft coupling device and a second shaft coupling device are arranged on the rotary platform; a first workpiece platform rotating shaft is arranged at the bottom of a first workpiece platform; a first workpiece platform switching device is arranged on the lateral surface of the first workpiece platform; a first workpiece platform gear is arranged at the waist part of the first workpiece platform; a second workpiece platform rotating shaft is arranged at the bottom of a second workpiece platform; a second workpiece platform switching device is arrangedon the lateral surface of the second workpiece platform; and a second workpiece platform gear is arranged at the waist part of the second workpiece platform. According to the rotary exchanging methodand the rotary exchanging device disclosed by the invention, in the switching process of double platforms, the orientations of the workpiece platforms are always kept unchanged and the problems that a cable in a traditional rotary platform switching scheme is not convenient to mount and an interferometer loses a target are solved; and meanwhile, the rotary exchanging method and the rotary exchanging device disclosed by the invention have the advantages that a rotational inertia in the specific implementation process is small, the required torque under the same platform switching time is smalland the like.

Description

Technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and device for rotating and exchanging double worktables based on synchronous direction adjustment of turntable gears. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. In the step-and-scan projection lithography machine widely used at present, the work stage technology is one of the core technologies of the lithography machine. The main function of the workpiece table is to carry silicon wafers to achieve nanometer-precision positioning under high-speed and high-acceleration conditions, and to cooperate with the processing and manufacturing processes of loading, pre-alignment, alignment, exposure and unloading in the photolithography process. The lithography machine work piece technology is very important to improve the three perfo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/67H01L21/677
Inventor 谭久彬杨远源王雷
Owner HARBIN INST OF TECH
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