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Ralstonia pickettii highly resistant to cadmium and extraction method and application thereof

An extraction method and resistance technology, applied in the field of Ralstonia piteri strains, to achieve the effects of easy-to-obtain strain sources, strong cadmium resistance characteristics, and environmental friendliness

Inactive Publication Date: 2012-07-04
DONGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, phenol-containing industrial wastewater often contains high concentrations of heavy metal ions, and the presence of high concentrations of heavy metal ions will inhibit the biodegradation of phenol by microorganisms

Method used

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  • Ralstonia pickettii highly resistant to cadmium and extraction method and application thereof
  • Ralstonia pickettii highly resistant to cadmium and extraction method and application thereof
  • Ralstonia pickettii highly resistant to cadmium and extraction method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Controlled addition of highly cadmium-resistant bacteria to heavy metal Cd 2+ In the 0.1×PTYG culture solution with a concentration of 4mM / L, the 0.1×PTYG culture solution contains 0.25g peptone, 0.25g tryptone, 0.5g yeast powder, 0.5g glucose, MgSO 4 ·7H 2 O 30mg, CaCl 2 2H 2 O 3.5mg, cycloheximide 0.3g, distilled water to 1L, 1×10 5 Pa was sterilized for 30 minutes, and the pH was about 7. After 12 hours of cultivation, the bacteria grew well. Inoculum coated on Cd-containing 2+In the 0.1×PTYG solid plate, add 1.5% agar to the corresponding culture medium. The strains screened within 5 days can grow well on 16mM / L 0.1×PTYG solid plate.

Embodiment 2

[0032] Controlled addition of highly cadmium-resistant bacteria in the phenol inorganic salt medium with a concentration of 300, 400, 500, 600, 700, 800 mg / L, and observed the degradation rate. Among them, the inorganic salt medium is KH 2 PO 4 1.0g, (NH 4 ) 2 SO 4 1.0g, NaCl 1.0g, CaCl 2 2H 2 O 0.1g, MgSO 4 ·7H 2 O 0.2g, distilled water to 1L, 1×10 5 Pa was sterilized for 30 minutes, and the pH value was about 7. The test results of 48 hours showed that when the concentration was 300, 400, and 500 mg / L, phenol could be almost completely degraded in 60 hours.

Embodiment 3

[0035]

[0036]

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PUM

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Abstract

The invention relates to Ralstonia pickettii highly resistant to cadmium and an extraction method and application thereof, wherein the strain is highly resistant to cadmium and has ability of degrading phenol. The maximum tolerance of the strain against the heavy metal cadmium in a liquid medium can reach 18mM / L and 16mM / L in a solid medium, showing very strong cadmium resistance. The degradation rate of the strain against phenol of 500mg / L or below is 100% within 60 hours. The degradation rate of the strain against phenol of less than 1,000mg / L in an environment suffering combined pollution of phenol and heavy metal cadmium can reach over 75% within 100 hours, and the Cd2<+> of 1mM / L (112mg / L) is tolerable.

Description

technical field [0001] The invention belongs to the field of Ralstonia piternii strains, and in particular relates to a Ralstonia piternii highly resistant to cadmium and its extraction method and application. Background technique [0002] Phenol is an organic pollutant produced in industrial processes such as papermaking, oil refining, pharmaceuticals, and coking, which can have toxic or even fatal effects on animals and plants. The discharge and accumulation of a large number of phenolic substances and their derivatives in soil and water has led to the deterioration of the ecological environment, and many countries have included them in the blacklist of environmental priority pollutants. In recent years, with the development of new biological technologies, the use of microbial degradation to treat high-concentration phenol-containing wastewater is a cost-effective method that does not cause secondary pollution, and related research has attracted more and more attention. H...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C12N1/20C12N1/36C02F3/34C12R1/01C02F101/20C02F101/34
Inventor 谢学辉付瑾柳建设陈小光王兆慧范凤霞袁学武刘娜朱文祥平婧
Owner DONGHUA UNIV
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