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Preparation method of micro-lens array based on negative photoresist and mask moving exposure process

A negative photoresist and microlens array technology, applied in the field of micro-nano processing, can solve the problem of difficult to produce continuous changes and so on

Inactive Publication Date: 2013-11-20
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the exposure characteristics of negative photoresists determine that it is difficult to produce continuously changing surface shapes, and are generally only used to process structures with obvious steps

Method used

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  • Preparation method of micro-lens array based on negative photoresist and mask moving exposure process
  • Preparation method of micro-lens array based on negative photoresist and mask moving exposure process
  • Preparation method of micro-lens array based on negative photoresist and mask moving exposure process

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Embodiment 1

[0037] refer to figure 1 Flow process, utilize preparation method of the present invention, adopt negative photoresist NR5-8000 to process microlens on K9 glass substrate, specifically comprise the following steps:

[0038] 1) Select K9 glass as the substrate: ultrasonically clean the glass with a thickness of 5 mm with acetone, alcohol, and deionized water in sequence, each step is cleaned for 5 minutes, dried with nitrogen, and then placed in an oven at 120 ° C for 30 minutes; complete later as figure 2 ;

[0039] 2) Coating of negative photoresist: Put the prepared substrate into the coating machine, and apply the negative photoresist NR5-8000 on the glass substrate by spin coating, the rotation speed of spin coating is 5000rpm, the coating thickness is 6.5um, then place the substrate coated with photoresist on the hot plate, and bake at 150°C for 1min; after completion, as image 3 ;

[0040] 3) Maskless exposure: Put the substrate coated with photoresist into the exp...

Embodiment 2

[0046] The preparation method of this embodiment is the same as that of Embodiment 1, except that a quartz material is used as a substrate, and a microlens with a sagittal height of 20 μm and an aperture of 500 μm is fabricated by ion beam etching, and the specific conditions are as follows:

[0047] 1) Choose quartz as the substrate: The quartz substrate with a thickness of 10mm is ultrasonically cleaned with acetone, alcohol, and deionized water in sequence, each step is cleaned for 5 minutes, dried with nitrogen, and then placed in an oven at 120°C for 30 minutes; After completion as figure 2 ;

[0048] 2) Coating of negative photoresist: Put the prepared substrate into the coating machine, and apply the negative photoresist NR5-8000 on the glass substrate by spin coating, the rotation speed of spin coating is 800rpm, the thickness of the coating is 23um, then place the substrate coated with photoresist on the hot plate, and bake at 120°C for 3min; after completion, as ...

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Abstract

The invention provides a preparation method of a micro-lens array based on a negative photoresist and a mask moving exposure process, which comprises the following main technological procedures of: selecting a substrate, coating a negative photoresist, carrying out exposure without a mask on the substrate firstly, then carrying out the processes of mask moving exposure, after baking and developing so as to obtain the figure of the photoresist of a micro-lens array, and finally, transferring the figure of the photoresist onto the substrate by adopting dry-method etching so as to obtain a micro-lens array structure. The preparation method of the micro-lens array based on the negative photoresist and the mask moving exposure process has the advantage that the processing of the micro-lens array with a continuous surface shape is realized by utilizing the negative photoresist. Because the negative photoresist has better property of etching resistance and the figure of the photoresist is also not easy to deform at higher temperature, the processing method of the micro-lens array not only can be used for preparing a common micro-lens array but also can be used for processing a micro-lens array needing deep etching or prepared on a thick substrate.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing, and in particular relates to a preparation method of a microlens array based on negative photoresist and mask moving exposure technology. Background technique [0002] The microlens array is a plurality of microlenses arranged according to certain rules, and the unit size is generally on the order of microns. Microlens arrays are widely used in beam smoothing, liquid crystal display, wavefront sensing, CCD or CMOS sensors, etc. [0003] At present, the most commonly used microlens array processing methods mainly include hot-melt method, direct writing method, gray-scale mask and moving mask method, etc., and these methods have their own characteristics. Among them, the hot-melt method processes the photoresist into mutually independent microcolumn arrays, and then heats the substrate to melt the photoresist. Under the action of surface tension, the photoresist cylinders gradually b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B3/00G03F7/00G03F7/004
Inventor 岳衢李国俊潘丽邱传凯周崇喜李飞
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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