Two-dimensional side coupling photonic crystal waveguide single-channel system
A photonic crystal waveguide and side-coupling technology, applied in the directions of light guides, optics, optical components, etc., can solve the problems of difficulty in controlling the distance parameters between the graded optical fiber and the photonic crystal device, the influence of integration, and limitations, and achieve compact structure and low bending loss. , the effect of high integration
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specific Embodiment approach 1
[0018] Specific implementation mode one, combination Figure 1 to Figure 5 To illustrate this embodiment, the two-dimensional side-coupled photonic crystal waveguide single-channel system of this embodiment includes a waveguide layer 13, a low refractive index buried layer 7, and a substrate layer 8. The waveguide layer is located on the low refractive index buried layer 7. On the upper part, the lower part of the low refractive index buried layer 7 is connected to the substrate layer 8; the waveguide layer includes a waveguide first region 1, a defect region 10, and a waveguide second region 2; a defect region is distributed at the junction of the waveguide first region 1 and the waveguide second region 2 10. The first area 1 of the waveguide is composed of a plurality of dielectric pillars 9 periodically arranged, the outermost row of the second area 2 of the waveguide is distributed with coupling dielectric pillars 12, and this row of coupling dielectric pillars 12 constitutes...
specific Embodiment approach 2
[0034] Specific implementation mode two, combination Figure 6 to Figure 9 To describe this embodiment, the specific manufacturing process of the two-dimensional side-coupled photonic crystal waveguide single-channel system described in this embodiment and specific implementation 1:
[0035] The first step is to prepare the dicing groove required for dicing: such as Image 6 As shown in a~6g.
[0036] (A) The counter substrate silicon 101 is 600 μm thick, on which a 3 μm thick silicon dioxide layer 102 is grown (such as Image 6 a) Carry out cleaning treatment;
[0037] (B) such as Image 6 As shown in b, a strontium titanate film 103 is prepared on the silicon dioxide layer 102 by a sol-gel method;
[0038] (C) such as Image 6 As shown in c, a photoresist film 104 with a thickness of 2-3 μm is coated on the strontium titanate film 103;
[0039] (D) Put the completed structure in step (C) into an oven before baking;
[0040] (E) such as Image 6 As shown in d, ultraviolet exposure is p...
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