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Polishing accelerating agent for glass and silicon-containing compound and production method and application thereof

A technology of polishing accelerator and silicon compound, which is applied in the direction of chemical instruments and methods, polishing compositions containing abrasives, polishing compositions, etc., which can solve the problems of rapid wear of polishing machines, low flattening polishing efficiency, high solid content of polishing powder, etc. problems, achieve stable polishing effect, improve flattening polishing efficiency, and reduce the amount of polishing powder

Inactive Publication Date: 2012-08-08
JIANGSU SINO KRYSTALS OPTROINCS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, the polishing of glass and silicon-containing compounds mainly uses large-grained rare earth oxide powder as a polishing abrasive. The overall polishing rate is low, the dispersion stability is poor, and it is easy to cause serious surface scratches, and there are also defects such as low flattening and polishing efficiency.
Long-time polishing often greatly reduces the polishing efficiency, resulting in rapid wear of the polishing machine, low production efficiency, and a large consumption of consumables
At the same time, the polishing powder used in the current polishing process has a high solid content, is difficult to clean, and has a large amount of solid waste, which poses a great burden on environmental pollution and disposal

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Preparation:

[0025] Weigh 100 grams of polyacrylic acid (molecular weight: 10,000), and 400 grams of polypropylene alcohol ether, add them into 5,000 grams of water, and stir evenly. Then add 2000 grams of water glass Na with a mol ratio of 2.1 2 O.nSiO 2 , stir well. Then add 300 grams of decane polyethylene oxide phosphate, and adjust the pH value to 12 with phosphoric acid.

[0026] Raise the temperature of the above mixed suspension to 40°C, keep it warm for 6 hours, then cool down to 25°C, and then adjust the pH to 8 with phosphoric acid.

Embodiment 2

[0037] Preparation:

[0038] Weigh 200 grams of polyethylamine (molecular weight 10000), 500 grams of alkyl ether alcohol, add to 5000 grams of water, and stir evenly. Then add 3000 grams of K with a molar ratio of 2.1 2 O.nSiO 2 , stir well. Then add 300 g of decane polyethylene oxide phosphate, and adjust the pH value to 9 with phosphoric acid.

[0039] Raise the temperature of the above mixed suspension to 60°C, keep it warm for 2 hours, then lower the temperature to 25°C, and adjust the pH to 12 with phosphoric acid.

[0040] Applications:

[0041] 1), in 4500 grams of water, add 250 grams of polishing accelerator prepared by the above formula and synthesis process, stir well. Then add 250 grams of Tianjiao Qingmei mixed rare earth polishing powder purchased on the market, stir well to form a polishing liquid, which can be used.

[0042] The prepared samples were polished on a Logitech CDP single-side polisher. Down pressure: 1psi, rotation speed of the lower plate ...

Embodiment 3

[0048] Preparation:

[0049] Take by weighing 200 grams of polymaleic acid (molecular weight 20000), add in 5000 grams of water, stir well. Then add 3000 grams of water glass Na with a mol ratio of 2.1 2 O.nSiO 2 , stir well. Then add 300 g of decane polyethylene oxide phosphate, and adjust the pH value to 10 with phosphoric acid.

[0050] Raise the temperature of the above mixed suspension to 90°C, keep it warm for 1 hour, then lower the temperature to 25°C, and adjust the pH to 8 with phosphoric acid.

[0051]Applications:

[0052] 1), in 4500 grams of water, add 500 grams of polishing accelerator prepared by the above formula and synthesis process, stir well. Then add 500 grams of zirconia (1.5 microns in particle size) purchased on the market and stir well to form a polishing solution. The pH is adjusted to 9.3 and can be used.

[0053] The prepared samples were polished on a Logitech CDP single-side polisher. Down pressure: 1psi, rotation speed of the lower plate a...

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PUM

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Abstract

A polishing accelerating agent for glass and silicon-containing compound and a production method thereof. The agent is characterized by containing 0.001-50 wt% of silicate polymer with a molecular weight between 100 and 20000, and 0.001-20wt % of polymer containing more than one polar functional groups or copolymer containing different polar functional group monomers, with a molecular weight between 500 and 20000. The production method is as below: adding the above components sequentially into water to form a suspension, and adjusting a pH to 5-12; and heating the suspension to 20-90 DEG C, insulating for 0.1-6 h and cooling to 10-25 DEG C. The production method of the accelerating agent is simple; the product has good dispersion stability, high polishing efficiency and reduces dosage of rare rare-earth polishing powder; meanwhile, environmental pollution is reduced.

Description

technical field [0001] The invention relates to a polishing accelerator for polishing glass and silicon-containing compounds, a production method and an application in the polishing process of glass and silicon-containing compounds. Background technique [0002] At present, the polishing of glass and silicon-containing compounds mainly uses large-grained rare earth oxide powder as a polishing abrasive. The overall polishing rate is low, the dispersion stability is poor, and it is easy to cause serious surface scratches, and there are also defects such as low flattening and polishing efficiency. Long-time polishing often greatly reduces the polishing efficiency, resulting in rapid wear of the polishing machine, low production efficiency, and a large consumption of consumables. At the same time, the polishing powder used in the current polishing process has a high solid content, is difficult to clean, and has a large amount of solid waste, which poses a great burden on environ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/16C09G1/02
Inventor 孙韬
Owner JIANGSU SINO KRYSTALS OPTROINCS
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