Method for preparing SiC ceramic precursor for chemical liquid-vapor deposition process
A ceramic precursor and gas phase deposition technology, which is applied in the field of preparing SiC ceramic precursors for chemical liquid vapor deposition process, can solve the problems of high production cost, low deposition efficiency, pollution of environmental equipment, etc., and achieve good fluidity and high deposition efficiency , the effect of low boiling point
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Embodiment 1
[0016] Adopting the present invention to prepare the SiC ceramic precursor for chemical liquid vapor deposition process comprises the following steps:
[0017] 1. Place the polydimethylsilane powder in a three-necked flask equipped with a condenser tube and a receiving device. 2 Heated to 350°C for 4h under protection to obtain liquid carbosilane.
[0018] 2. Filter the liquid carbosilane in (1) to obtain pure carbosilane, and then put it in a normal pressure reactor, under N 2 Heating to 450° C. for 8 hours under protection to obtain a liquid carbosilane precursor crude product.
[0019] 3. After the crude product of the liquid carbosilane precursor is filtered, the filtrate is placed in a normal pressure reactor, and the 2 Heating to 200°C under atmosphere, keeping it warm for 1h, and then performing vacuum distillation under reduced pressure to collect fractions with a boiling point between 100°C and 200°C, with a yield of 45.8%, to obtain a liquid carbosilane precursor. ...
Embodiment 2
[0021] Adopting the present invention to prepare the SiC ceramic precursor for chemical liquid vapor deposition process comprises the following steps:
[0022] 1. Place the polydimethylsilane powder in a three-necked flask equipped with a condenser tube and a receiving device. 2 Heating to 450° C. for 10 h under protection to obtain liquid carbosilane.
[0023] 2. Filter the liquid carbosilane in (1) to obtain pure carbosilane, and then put it in a normal pressure reactor, under N 2 Heating to 500° C. for 20 h under protection to obtain a liquid carbosilane precursor crude product.
[0024] 3. After the crude product of the liquid carbosilane precursor is filtered, the filtrate is placed in a normal pressure reactor, and the 2 atmosphere
[0025] Heating to 200°C under low temperature, keeping it warm for 1h, and then performing vacuum distillation to collect fractions with a boiling point between 100°C and 200°C, with a yield of 38.2%, to obtain a liquid carbosilane precur...
Embodiment 3
[0027] Adopting the present invention to prepare the SiC ceramic precursor for chemical liquid vapor deposition process comprises the following steps:
[0028] 1. Place the polydimethylsilane powder in a three-necked flask equipped with a condenser tube and a receiving device. 2 Heated to 350° C. for 0.5 h under protection to obtain liquid carbosilane.
[0029] 2. Filter the liquid carbosilane in (1) to obtain pure carbosilane, and then put it in a normal pressure reactor, under N 2 Heating to 450° C. for 1 hour under protection to obtain a liquid carbosilane precursor crude product.
[0030] 3. After the crude product of the liquid carbosilane precursor is filtered, the filtrate is placed in a normal pressure reactor, and the 2 Heating to 160°C under the atmosphere, keeping it warm for 3 hours, and then performing vacuum distillation to collect fractions with a boiling point between 100°C and 160°C, with a yield of 52.4%, to obtain a liquid carbosilane precursor.
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Abstract
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