Method for preparing graphene nanoribbon
A graphene nanoribbon and graphene technology, applied in the direction of graphene, nanocarbon, nanotechnology, etc., can solve the problems of uneven edges of graphene nanoribbons, difficulties in meeting the requirements of devices and integrated circuits, and many defects
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Embodiment 1
[0025] (1) Using the method of mechanical exfoliation, using highly oriented graphite, in 300nm-SiO 2 Graphene is prepared on a p-Si substrate, and an area of about 40 μm is selected 2 Triangular graphene sample, the sample's The crystal orientation is perpendicular to the angle bisector k of the vertex angle α, and the angle α=60°.
[0026] (2) Using electron beam exposure and thermal evaporation, vapor-deposit 4nm Ni at a distance of about 500nm from the corner vertex on one side and then anneal, and deposit a Ni particle with a diameter of less than 100nm on the edge of the graphene.
[0027] (3) Put the sample into a high temperature tube furnace under Ar / H 2 (150sccm / 30sccm) atmosphere annealing, before heating up, ventilate for 10min, raise the temperature to 900°C for 30min, keep warm for 2h, continue to ventilate until naturally cooled to room temperature, and then take out the sample.
[0028] (4) Observed by SEM such as image 3 Sequential etch traces and resu...
Embodiment 2
[0030] (1) CVD growth of graphene on copper foil, and then transfer the graphene to 90nm-SiO 2 / p-Si substrate.
[0031] (2) Select a piece with an area of about 80 μm 2 Graphene as the experimental object, determined by STM crystal direction.
[0032] (3) Combining electron beam exposure and plasma etching, etch the graphene into a fan shape, so that the angle bisector k of the top angle α of the fan shape and The crystal orientation is vertical.
[0033] (4) Combining electron beam exposure and electron beam evaporation, such as figure 2 The area shown (L=150nm) is annealed after evaporation of 3nm Co, and a Co particle with a diameter of about 50~80nm is deposited on the edge of the graphene.
[0034] (3) Put the sample into a high temperature tube furnace under Ar / H 2 Annealed under atmosphere. Pass Ar / H before annealing starts 2 (100sccm / 20sccm), start to heat up after aeration for 10min, keep warm for 1.5h after heating up to 1100°C, continue to feed Ar and ...
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