Double-light-beam exposure system and method for manufacturing photonic crystal mask layer

A technology of photonic crystals and exposure systems, applied in microlithography exposure equipment, photolithography exposure devices, optics, etc., can solve the problems of low production efficiency, difficulty in mass production, and high production costs, and achieve high production capacity and easy implementation , low-cost effect
CN102707584AInactive Publication Date: 2012-10-03HANGZHOU SILAN AZURE
9 Cites 4 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
HANGZHOU SILAN AZURE
Publication Date
2012-10-03
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention discloses a double-light-beam exposure system for manufacturing a photonic crystal mask layer. The double-light-beam exposure system comprises a laser light source, a beam expansion collimation system, a beam splitting and light gathering device and two rotary wafer clamps, wherein the beam splitting and light gathering device comprises a first beam splitting and light gathering prism, a second beam splitting and light gathering prism and two reflectors; the laser light source, the beam expansion collimation system and the first beam splitting and light gathering prism are sequentially arranged from front to back; the two reflectors are respectively positioned on the back and the side face of the first beam splitting and light gathering prism; positions where the first beam splitting and light gathering prism, the second beam splitting and light gathering prism and the two reflectors are positioned form a parallelogram; the two rotary wafer clamps are respectively positioned on the back and the side face of the second beam splitting and light gathering prism; and an electric shutter is arranged between the laser light source and the beam expansion collimation system or between the beam expansion collimation system and the first beam splitting and light gathering prism. The invention also discloses a double-light-beam exposure method for manufacturing the photonic crystal mask layer. The double-light-beam exposure system is simple in structure, low in cost and easy to implement.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention belongs to the field of semiconductor manufacturing lithography, and in particular relates to a double-beam exposure system and method which can be used for making a photonic crystal mask layer. Background technique

[0002] With the improvement of people's living standards, the enhancement of environmental awareness, the continuous improvement of the pursuit of home environment, leisure and comfort. Lamps and lighting are gradually shifting from simple lighting functions to the coexistence of decoration and lighting. It is inevitable that LEDs, which have dual advantages of lighting and decoration, will replace traditional light sources and enter people's daily lives.

[0003] At present, the biggest problem encountered by LEDs completely replacing traditional light sources in the lighting field is the brightness problem and the heat dissipation problem. In fact, these two problems are the same problem. When the brightness is improved, t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More