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In-situ measurement method for optical free-form surface

An in-situ measurement, free technology, applied in measurement devices, optical devices, measurement/indication devices, etc., can solve problems affecting the manufacture of high-quality optical free-form surfaces, achieve good application value, avoid errors, and simple system structure. Effect

Inactive Publication Date: 2012-10-10
TIANJIN UNIV
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  • Application Information

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Problems solved by technology

However, there is no public report on the in-situ measurement method to realize the optical quality of optical free-form surfaces, which directly affects the manufacture of high-quality optical free-form surfaces.

Method used

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  • In-situ measurement method for optical free-form surface
  • In-situ measurement method for optical free-form surface
  • In-situ measurement method for optical free-form surface

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Embodiment Construction

[0016] Wavefront aberration is an important evaluation parameter to evaluate the imaging quality of optical devices. The best analysis method of wavefront aberration is Zernike polynomial decomposition method. Each Zernike item obtained by decomposition has a specific optical index meaning, such as traditional geometric optics describing the position error, primary aberration, and advanced aberration of imaging quality, and the basic imaging quality evaluation index can be obtained through polynomial combination. Focus, spherical aberration, coma, etc.) and comprehensive evaluation functions (modulation transfer function, point spread function, etc.) to evaluate the optical quality of the system. Therefore, wavefront aberration measurement can be used as an important measure of optical quality. Wavefront aberrations can be measured using interference theory and ray tracing theory, and the most commonly used are Twyman-Green interference and Shack-Hartmann wavefront sensor (SHW...

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Abstract

The invention belongs to the technical field of manufacture of parts with optical free-form surfaces in advanced manufacture, and relates to an in-situ measurement method for an optical free-form surface. The in-situ measurement method includes 1), building a wave-front aberration measuring system and fixing the measuring system and a first machining cutter onto an ultra-precision machining lathe together; 2), testing optical quality of a machined device by the wave-front aberration measuring system after the optical free-form surface is machined, and obtaining wave-front aberration data; and 3), solving various parameters of a Zernike polynomial according to the measured wave-front aberration data of the machined workpiece and computing basic imaging quality evaluation indexes, a modulation transfer function and a point spread function which are used for comprehensively evaluating optical quality. The optical imaging quality is used as a direct measuring object, the in-situ measurement method is different from a traditional mode for measuring surface shape data and can effectively meet actual application requirements, and errors introduced by secondary clamping and the like are avoided.

Description

Technical field [0001] The invention belongs to the technical field of optical surface free-form surface parts manufacturing in advanced manufacturing. Background technique [0002] Free-form surface is a kind of complex surface form, its main characteristic is that it does not have a symmetry axis. Free-form surface devices are widely used in many fields, and they are called optical free-form surfaces when used in optical devices. In view of the characteristics of the special surface of free-form surfaces, it has the characteristics of correcting aberrations, improving image quality, and expanding the field of view in optical applications. Therefore, it is gradually replacing traditional rotating optical surfaces (such as spherical, aspherical, etc.). A generation of optical components. Various application fields put forward extremely strict requirements on the processing accuracy of optical free-form surfaces, such as surface accuracy reaching sub-micron level and surface rou...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23Q17/20B23Q17/24B23B25/06G01B11/24
Inventor 张效栋房丰洲吴青青王伟
Owner TIANJIN UNIV
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