Etchant composition
A technology of composition and etching solution, applied in the directions of surface etching compositions, chemical instruments and methods, can solve problems such as uneconomical, complicated etching process, etc., and achieve the effects of increased production and simple etching process
Active Publication Date: 2012-10-24
DONGWOO FINE CHEM CO LTD +1
View PDF2 Cites 1 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Therefore, the etching process becomes complicated and uneconomical
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment 1～ Embodiment 7 and comparative example 1～ comparative example 6
[0025] Example 1-Example 7 and Comparative Example 1-Comparative Example 6: Manufacture of Etching Solution Composition
[0026] 180 kg of etching solution compositions were manufactured according to the components and composition ratios listed in Table 1 below.
[0027] Table 1
[0028]
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more PUM
Login to view more Abstract
The present invention relates to an etchant composition for etching a triple film consisting of an indium-based metal film, an aluminum-lanthanum-based alloy film, and a titanium-based metal film, wherein the etchant composition comprises: 1 to 15 wt % of hydrogen peroxide; 0.1 to 10 wt % of inorganic acid; and 0.01 to 5 wt % of a fluorine compound, with the remainder being water.
Description
technical field [0001] The invention relates to an etchant composition of a triple film composed of an indium series metal film, an aluminum-lanthanum series alloy film and a titanium series metal film. Background technique [0002] In flat panel display devices, the process of forming metal wiring on a printed circuit board generally consists of a process of forming a metal film by sputtering, coating a photoresist on the metal film, and exposing the photoresist to light. And development is comprised of the process of forming a photoresist within a selected range, and the process of etching a metal film. In addition, individual washing steps performed before or after the unit steps are also included. This etching process refers to a process of using a photoresist as a mask to leave a metal film in a selected range. In the etching step, dry etching using plasma or the like, or wet etching using an etching solution is generally used. [0003] On the other hand, in a flat p...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more Application Information
Patent Timeline
Login to view more Patent Type & Authority Applications(China)
IPC IPC(8): C09K13/08C23F1/20C23F1/30
CPCC09K13/08C23F1/16
Inventor 李昔准慎蕙驘权五柄李喻珍
Owner DONGWOO FINE CHEM CO LTD
Who we serve
- R&D Engineer
- R&D Manager
- IP Professional
Why Eureka
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Social media
Try Eureka
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap