Etchant composition for silver layer and method for forming metal pattern and method for manufacturing display substrate using same

A composition and etchant technology, applied in the directions of surface etching compositions, chemical instruments and methods, semiconductor/solid-state device manufacturing, etc., can solve problems such as no etching characteristics etchant composition, etc., to improve etching characteristics, increase Wetting effect

Active Publication Date: 2019-05-07
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, an etchant composition having significantly improved etching characteristics compared with the above-mentioned conventional techniques has not been proposed

Method used

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  • Etchant composition for silver layer and method for forming metal pattern and method for manufacturing display substrate using same
  • Etchant composition for silver layer and method for forming metal pattern and method for manufacturing display substrate using same
  • Etchant composition for silver layer and method for forming metal pattern and method for manufacturing display substrate using same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to 6 and comparative example 1 to 6

[0049] Examples 1 to 6 and Comparative Examples 1 to 6: Preparation of etchant compositions

[0050] 150 kg of each etchant composition was prepared using the components in the amounts (unit: wt %) shown in Table 1 below.

[0051] [Table 1]

[0052]

[0053]

[0054] *MTZ: 5-Methyltetrazole

[0055] Each etchant composition was placed in ETCHER (TFT) (manufactured by K.C. Tech) as an etching device, and then heated to a temperature of 40°C. When the temperature reaches 40±0.1° C., an etching process is performed. Etching as overetch increases the total etch time by 50% compared to endpoint detection (EPD).

[0056] The substrate was placed in the etching equipment, etched by spraying, taken out from the etching equipment, rinsed with DI water and dried using a hot air dryer, and then the photoresist (PR) was removed using a PR stripper. After cleaning and drying, a scanning electron microscope (SEM, model name: S-4700, manufactured by HITACHI) was used to evaluate si...

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Abstract

The present invention relates to an etchant composition for a silver layer, which comprises, based on the total weight of the composition: 30 to 70 wt % of phosphoric acid, 0.5 to 10 wt % of nitric acid, 5 to 20 wt % of propionic acid, 0.01 to 10 wt % % azole compounds, and the balance of water; using the etchant composition to form a metal pattern and using the etchant composition to manufacture a display substrate method. The etchant composition of the present invention can prevent overetching of silver or silver alloy to form lines with low S / E, and thus can be used for fine pattern formation. In particular, the etchant composition of the present invention includes propionic acid instead of acetic acid used in conventional etchant compositions for silver layers, thereby increasing wettability, thereby significantly improving etching characteristics.

Description

technical field [0001] The present invention relates to an etchant composition for a silver layer, to a method of forming a metal pattern using the etchant composition, and to a method of manufacturing a display substrate using the etchant composition. Background technique [0002] A liquid crystal display (LCD) is one of various flat panel displays currently available, and is configured to include two substrates having electrodes and a liquid crystal layer interposed therebetween. When a voltage is applied to the electrodes, the liquid crystal molecules in the liquid crystal layer rearrange, thereby controlling the amount of light transmitted. [0003] When the data line is lengthened, the line resistance is also increased. Therefore, conventionally using chromium (Cr), molybdenum (Mo), aluminum (Al) and their alloys as gate lines and data lines of thin film transistors (TFTs) is difficult to realize a flat panel display with large size and high resolution. For the purpos...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/30C23F1/44H01L21/28H01L27/12
CPCH01L27/1259H01L21/28H01L21/28008C23F1/30C23F1/44C23F1/02C09K13/06G02F1/136286H01L29/786G02F1/1303G02F1/1368
Inventor 李承洙沈庆辅安基熏
Owner DONGWOO FINE CHEM CO LTD
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