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Method for welding target and rear plate

A welding method and target material technology, applied in the field of target material manufacturing, can solve problems such as poor thermal conductivity, unfavorable sputtering, poor zinc toughness, etc., and achieve the effect of increasing the effective area, avoiding adverse changes, and improving welding strength

Active Publication Date: 2015-06-10
GRIKIN ADVANCED MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, zinc has poor toughness and poor thermal conductivity. Simply using zinc as the welding intermediate layer is not conducive to sputtering under high-power conditions, while aluminum or copper has good toughness and excellent thermal conductivity. Using zinc / aluminum or zinc / copper composite The middle layer can achieve high-strength and high-reliability welding of the cobalt target and the copper alloy backplane at a relatively low temperature

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  • Method for welding target and rear plate

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Effect test

Embodiment 1

[0018] Welding example of high-purity cobalt target and copper-chromium backplate. Both the diameter of the high-purity cobalt target and the back plate are 330mm, the thickness of the cobalt target is 3mm, and the thickness of the copper-chrome back plate is 10mm. First, a 0.2mm deep annular groove is processed on the welding surface of the high-purity cobalt target and the copper-chromium back plate; the middle layer is made of zinc / copper composite material, and the zinc is connected with cobalt, and the copper is connected with copper-chromium, and the middle layer is made of pure The surface of the copper plate is made of sprayed pure zinc, the total thickness is about 1mm, and the thickness of the zinc layer is 50~200μm; the hot pressing method is used for diffusion welding, the temperature is 390°C, the pressure is 20MPa, and the holding time is 3 hours. After cooling in the furnace, the structure of the obtained target assembly is shown in figure 1 .

[0019] Welding ...

Embodiment 2

[0021] Welding example of high-purity cobalt target and copper-zinc backplane. Both the diameter of the cobalt target and the back plate are 440mm, the thickness of the cobalt target is 4mm, and the thickness of copper and zinc is 10mm: First, a V-shaped groove with a depth of 0.1mm is processed on the welding surface of the high-purity cobalt target and the copper-zinc back plate; the middle layer is made of Zinc / aluminum / zinc composite material, made of electro-galvanized on both sides of pure aluminum plate, the total thickness is about 2mm, and the thickness of zinc coating on one side is 30~50μm; Diffusion welding is carried out by hot isostatic pressing, the temperature is 370℃, the pressure is 60MPa, and the heat preservation After 5 hours of cooling with the furnace, the structure of the obtained target assembly is shown in figure 1 .

[0022] Welding quality inspection: After welding, the cobalt target assembly is tested by PTF, and its magnetic permeability has no o...

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Abstract

The invention discloses a method for welding a target and a rear plate, and belongs to the field of target manufacture technologies. The welding method comprises the steps as follows: processing concave grooves on the cobalt target and the rear plate, and welding the cobalt target on the copper alloy rear plate through a low-temperature diffusing welding method by utilizing a multi-layer composite material intermediate layer. According to the method, the multi-layer material intermediate layer is adopted to weld large-scale cobalt target at a low temperature, so that the magnetic performance of the cobalt target can be prevented from changing, the welding strength of the cobalt target and the copper alloy rear plate can be improved, a target subassembly can prevent from cracking in the sputtering process, and the sputtering performance of the cobalt target can be ensured.

Description

technical field [0001] The invention belongs to the technical field of target material manufacturing, and in particular relates to a welding method for a target material and a back plate. Background technique [0002] A variety of sputtering targets for industrial applications are components that meet the sputtering requirements and are connected to the back plate. Under the existing sputtering technology, the working conditions of the target components are harsh, and the temperature on one side of the target during sputtering can be low. Reach 300℃~400℃, and at 10 -5 Under Pa high vacuum, the side of the back plate is cooled by a certain pressure of cooling water, so a huge temperature difference and pressure difference are formed on both sides of the target component, and at the same time, the target side is subjected to high voltage electric field and strong magnetic field. The bombardment of these particles generates a lot of heat. Therefore, there are strict requireme...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/00B32B15/18B23K20/08
Inventor 徐学礼江轩王兴权王欣平李勇军何金江顾新福范亮曾浩
Owner GRIKIN ADVANCED MATERIALS