Metallization method for blind hole of printed circuit board
A printed circuit board and metallization technology is applied in the field of preparation and metallization of blind holes of high-density printed circuit boards. Simple, cost saving, high efficiency
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Embodiment 1
[0027] This example realizes the metallization of the blind hole of the printed circuit board with an aperture of 0.15mm.
[0028] CO 2 The laser drilling machine makes printed circuit board blind holes with an aperture of 0.15mm. After the blind holes have been subjected to surface grinding and wall cleaning, CO with a power of 5600kw, a frequency of 100Hz and a pulse width of 4ms is used. 2 The laser beam hits the copper surface at the bottom of the blind hole, which induces sputtering of copper particles and is adsorbed to the hole wall. Finally, the whole board is electroplated in the electroplating cylinder of the vertical DC electroplating line. Micro-etching treatment cannot be performed in the pre-plating process to prevent the hole wall Adsorbed copper particles are microetched away. The electroplating parameters are set to: current density 12A / dm 2 , Plating time 105min. After the electroplating process is completed, copper is plated in the observation hole of the...
Embodiment 2
[0030] This example realizes the metallization of the blind hole of the printed circuit board with an aperture of 0.115mm.
[0031] CO 2 The laser drilling machine makes blind holes of printed circuit boards with an aperture of 0.115mm. After the blind holes are treated with surface grinding and blind hole wall cleaning, CO with a power of 5600kw, a frequency of 100Hz, and a pulse width of 4ms 2 The laser beam hits the copper surface at the bottom of the blind hole, which induces sputtering of copper particles and is adsorbed to the hole wall. Finally, the whole board is electroplated in the electroplating cylinder of the vertical DC electroplating line. Micro-etching treatment cannot be performed in the pre-plating process to prevent the hole wall Adsorbed copper particles are microetched away. The electroplating parameters are set to: current density 12A / dm 2 , Plating time 105min. After the electroplating process is completed, copper is plated in the observation hole of ...
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