Two-operation-mode ultraviolet detector with vertical structure and preparation method thereof
A dual-mode, UV detector technology, used in semiconductor devices, final product manufacturing, sustainable manufacturing/processing, etc., can solve the problems of slow device response, no gain, non-linearity, etc., and achieve high operating reliability. , without etching, the effect of simple preparation process
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[0041] The preparation method of the above-mentioned vertical structure dual working mode ultraviolet photodetector selected by the bias voltage includes the following steps:
[0042] 1) Epitaxially grow wide bandgap semiconductor thin film materials on homogeneous or heterogeneous substrates, which can be single-layer films or multilayer films. The basic feature is that the uppermost film has a band gap greater than 3.1eV and has High resistance characteristics, its resistivity value> 10 6 Ω·cm, the thickness of the uppermost film is between 50nm and 1mm; wide-gap semiconductor materials include ternary or quaternary alloy materials of GaN, AlN, ZnO, MgO, GaN, AlN, ZnO and MgO. SiC, Diamond, TiO 2 Wait.
[0043] 2) Use semiconductor micromachining technology to make ohmic contact electrodes on the back of the substrate; make Schottky contact electrodes on the semiconductor active layer. Schottky electrodes can take many forms, such as ring, square, and interdigital, etc. .
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