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Positive radiation-sensitive composition, interlayer insulating film for display element, and method for forming same

A radiation-sensitive composition technology, applied in the field of positive-type radiation-sensitive compositions, to achieve high dry etching resistance and good heat resistance

Active Publication Date: 2016-03-02
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, even among these technologies, a radiation-sensitive resin composition capable of forming a display having good heat resistance, transparency, surface hardness, and refractive index in addition to high dry etching resistance has not yet been obtained. Interlayer insulating film for components, and has sufficient radiation sensitivity

Method used

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  • Positive radiation-sensitive composition, interlayer insulating film for display element, and method for forming same
  • Positive radiation-sensitive composition, interlayer insulating film for display element, and method for forming same
  • Positive radiation-sensitive composition, interlayer insulating film for display element, and method for forming same

Examples

Experimental program
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Effect test

preparation example Construction

[0235]

[0236] The positive radiation-sensitive composition is mixed with the above-mentioned [A] polymer, [B] siloxane polymer and [C] photoacid generator, appropriate components as needed, and other optional components in a solvent. It is prepared in a dissolved or dispersed state. For example, the positive radiation sensitive composition can be prepared by mixing in a solvent at a specified ratio.

[0237] As the solvent, a solvent that can uniformly dissolve or disperse each component without reacting with each component can be suitably used. Examples of solvents include alcohols, ethers, alcohol ethers, glycol alkyl ether acetates, diethylene glycol alkyl ethers, propylene glycol monoalkyl ethers, and propylene glycol monoalkyl ether acetates. , Propylene glycol monoalkyl ether propionate, aromatic hydrocarbons, ketones, other esters, etc. These solvents can be used alone or in combination of two or more kinds.

[0238] As alcohols, for example methanol, ethanol, benzyl al...

Embodiment

[0272] Hereinafter, the present invention will be described in detail based on examples, but the present invention is not limited by the description of the examples.

[0273]

Synthetic example 1

[0275] In a flask equipped with a condenser and a stirrer, 7 parts by mass of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by mass of diethylene glycol ethyl methyl ether were added. Next, 5 parts by mass of methacrylic acid, 40 parts by mass of 1-ethoxyethyl methacrylate, 5 parts by mass of styrene, 40 parts by mass of glycidyl methacrylate, and 10 parts by mass of methacrylic acid were added. After nitrogen substitution of 2-hydroxyethyl acrylate and 3 parts by mass of α-methylstyrene dimer, stirring was started slowly. The temperature of the solution was raised to 70°C, and the temperature was maintained for 5 hours to obtain a polymer solution containing the polymer (A-1). The Mw of the polymer (A-1) was 9,000. The solid content concentration of the polymer solution was 32.1% by mass.

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Abstract

The invention discloses a positive radiation-sensitive composition, which contains: [A] in the same or different polymer molecules, a structural unit (I) containing a group represented by the following formula (1) and a ring-containing A polymer of the structural unit (II) of an oxy group, [B] a siloxane polymer, and [C] a photoacid generator. [B] The siloxane polymer is preferably a hydrolyzed condensate of a hydrolyzable silane compound represented by the following formula (2). The mass ratio of the [A] polymer to the total amount of the [A] polymer and the [B] siloxane polymer is preferably 5% by mass or more and 95% by mass or less.

Description

Technical field [0001] The present invention relates to a positive radiation sensitive composition, an interlayer insulating film for display elements, and a method of forming the same. Background technique [0002] In a display element, an interlayer insulating film is generally provided for the purpose of insulating between wirings arranged in layers. As a material for forming the interlayer insulating film, a positive radiation-sensitive composition is widely used, because the number of steps to obtain the necessary pattern shape is small and it is preferable to have sufficient flatness. [0003] As such a display element, for example, a display element such as a TFT type liquid crystal display element using an interlayer insulating film is manufactured through a process of forming a transparent electrode film on the interlayer insulating film, and then forming a liquid crystal alignment film thereon. At this time, since the interlayer insulating film is exposed to high tempera...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/039G03F7/075
CPCG03F7/0392G03F7/0757G03F7/40G03F7/039G03F7/075G03F7/09
Inventor 一户大吾
Owner JSR CORPORATIOON
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