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Preparation system for pulse laser deposition film under intense magnetic field

A technology of pulsed laser deposition and thin film preparation, which is applied in the direction of ion implantation plating, coating, metal material coating process, etc., to achieve the effect of avoiding cross contamination

Inactive Publication Date: 2015-05-27
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the particularity of film deposition under the extreme condition of strong magnetic field and the limitation of the narrow space of the superconducting magnet cavity, the in-situ growth system of PLD film under the strong magnetic field (~10T) generated by the superconducting magnet has so far been limited. Not reported and used

Method used

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  • Preparation system for pulse laser deposition film under intense magnetic field
  • Preparation system for pulse laser deposition film under intense magnetic field
  • Preparation system for pulse laser deposition film under intense magnetic field

Examples

Experimental program
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Embodiment 1

[0022] A pulsed laser deposition film preparation system under a strong magnetic field, such as figure 2As shown, it includes a vacuum chamber 1 and a high vacuum unit 2, the vacuum degree in the vacuum chamber 1 is controlled by the high vacuum unit 2, there is a quartz glass window 3 on the vacuum chamber 1, and a target stage is installed in the vacuum chamber 1 10 and the substrate stage 4, the heating control of the substrate stage 4 is realized by adding a control power supply, and the rotation of the substrate stage 4 is controlled by the stepping motor 5 outside the vacuum chamber 1. An excimer pulsed laser 6 is placed outside the vacuum chamber 1, and the pulsed laser light produced by it passes through a focusing lens 7 and a reflector 8, and then irradiates the target 9 through the quartz glass window 3. The vacuum chamber 1 is placed in a superconducting magnet bore, the substrate table 4 is placed in the central area of ​​the magnetic field, the target table 10 h...

Embodiment 2

[0027] A pulsed laser deposition film preparation system under a strong magnetic field, such as image 3 , 4 , 5 and 6, including a vacuum chamber 1 and a high vacuum unit 2, the vacuum degree in the vacuum chamber 1 is controlled by the high vacuum unit 2, there is a quartz glass window 3 on the vacuum chamber 1, and the vacuum chamber 1 A conjoined right-angle target stage 10 and a substrate stage 4 are installed in the center, an excimer pulse laser 6 is placed outside the vacuum chamber 1, and the pulsed laser light generated by it passes through a focusing lens 7 and an external reflector 8 Finally, the target 9 is irradiated through the quartz glass window 3, and two thin film deposition modes of the film surface perpendicular to the magnetic field direction and parallel to the magnetic field direction can be realized by moving the position of the target stage 10; the vacuum chamber 1 is placed in a In the bore of the superconducting magnet, the target stage 10 and the ...

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Abstract

The invention discloses a preparation system for a pulse laser deposition film under an intense magnetic field. The preparation system comprises a super-conducting magnet, a vacuum chamber, a quasimolecule pulse laser, a laser beam focusing and scanning device, a high vacuum unit, various control systems and the like; a substrate table, a rotatable and lifting target table and the like are arranged in the vacuum chamber; baffles are arranged in the vacuum chamber to avoid cross contamination of target materials; and an optic fiber camera is arranged near the target table and the substrate table so as to facilitate to observe vacuum indoor laser light alignment and film deposition situations. According to the preparation system provided by the invention, as the super-conducting magnet is used, the direction of the magnetic field is parallel or vertical to the surface of the deposition film; and the system can be used for performing film in-situ growth and after-annealing treatment under different magnetic field strengths at 0-15 teslas, and thus the micro-structure and functional properties of the deposition film are adjusted.

Description

technical field [0001] The invention relates to the field of film material preparation, in particular to a pulse laser deposition film preparation system under a strong magnetic field. Background technique [0002] As an ideal non-contact external field driving force, the magnetic field can increase the activity of reactants, promote ion diffusion, and affect the processes of grain nucleation, growth, migration of grain boundaries, and recrystallization during material synthesis and preparation. Even the magnetic field can change the electron spin and nuclear spin state of the reactants, which may induce new chemical reaction processes, change the preferred growth mode of materials, and obtain materials with novel structures and physical properties. This magnetic field effect in material preparation is directly related to the strength of the applied magnetic field and the magnetic susceptibility of the material. Therefore, the preparation of non-(weak) magnetic materials...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/28C23C14/35
Inventor 戴建明方军张科军吴文彬孙玉平
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI