Epitaxial growth method for improving GaN-based light-emitting diode (LED) quantum well structure to improve carrier recombination efficiency
A technology for epitaxial growth and recombination efficiency, which is applied in the field of epitaxial growth to improve the quantum well structure of GaN-based LEDs and improve the recombination efficiency of carriers, can solve problems such as limited effect, improve luminous intensity and brightness, reduce defect density, and improve luminous efficiency. Effect
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[0027] The present invention will be described in detail below in conjunction with specific embodiments. The following examples will help those skilled in the art to further understand the present invention, but do not limit the present invention in any form. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present invention. These all belong to the protection scope of the present invention.
[0028] Examples of the present invention were implemented using a Vecco K465 series MOCVD system.
[0029] Such as figure 1The shown LED epitaxial structure includes, from bottom to top, substrate 1, low-temperature GaN buffer layer 2, undoped high-temperature GaN buffer layer 3, Si-doped N-type GaN layer 4, shallow quantum well 5, Multi-quantum well light-emitting layer 6, low-temperature P-type GaN layer 7, P-type Al-GaN electron blocking layer 8, high-temperature P-type GaN layer 9, and P-type...
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