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A carbon film-assisted solar energy selective absorption film system and preparation method thereof

An absorbing film, solar energy technology, applied in solar thermal power generation, solar thermal devices, energy industry and other directions, can solve problems such as low emissivity, and achieve the effect of improving weather resistance and stability, long service life, low cost and high efficiency production

Active Publication Date: 2014-10-15
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The light-to-heat conversion efficiency of the currently disclosed absorbing film still needs to be improved, such as: the TiN disclosed in the patent publication number CN1594644A x o y The highest absorption rate in the film is only 94%, and the lowest emissivity is as high as 7%; the TiNO, TiAlNO, AlN, AlNO and Al disclosed in the patent publication number CN 101793437A 2 o 3 The absorption rate of the multilayer composite film system is greater than 93%, and the emissivity reaches 4%; the TiN disclosed in the patent publication number CN101240944A and CN 201196495Y x o y The film is coated with silicon dioxide SiO 2 After anti-reflection coating, the absorption rate reaches 96%, and the emissivity is lower than 4%.

Method used

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  • A carbon film-assisted solar energy selective absorption film system and preparation method thereof
  • A carbon film-assisted solar energy selective absorption film system and preparation method thereof
  • A carbon film-assisted solar energy selective absorption film system and preparation method thereof

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Embodiment 1

[0039] A carbon-film-assisted solar selective absorption film system 1 and a preparation method thereof.

[0040] The structure of this absorbing film is as attached figure 1 As shown, the thickness composition of each film layer is as follows:

[0041] Cu foil substrate / TiN x o y Thin film (50nm) / amorphous carbon thin film (100nm) / Si 3 N 4 Thin film (20nm) / SiO 2 Thin film (86nm).

[0042] The reflection spectrum of the film system is attached figure 2 As shown, the technical indicators of the film system are as follows:

[0043] According to the national standard GB / T6424-2007 and GB / T 4271-2007, the absorption rate of the film system reaches 97.8%, and the emissivity is 3.2%.

[0044] Taking the process parameters of the magnetron sputtering equipment used in this embodiment as an example, the preparation method of this absorbing film system is as follows:

[0045] First, using magnetron sputtering method, using Cu foil as the substrate, using TiN sintered accordin...

Embodiment 2

[0050] A carbon film-assisted solar selective absorption film system 2 and a preparation method thereof.

[0051] The structure of this absorbing film is as attached figure 1 As shown, the thickness composition of each film layer is as follows:

[0052] Ag-coated Cu foil substrate / TiN x o y Thin film (96nm) / amorphous carbon thin film (49nm) / Si 3 N 4 Thin film (25nm) / SiO 2 Thin film (89nm).

[0053] The reflection spectrum of the film system is attached image 3 As shown, the technical indicators of the film system are as follows:

[0054] According to the national standard GB / T6424-2007 and GB / T 4271-2007, the absorption rate of the film system reaches 98.0%, and the emissivity is 2.3%.

[0055] Taking the process parameters of the magnetron sputtering equipment used in this embodiment as an example, the preparation method of this absorbing film system is as follows:

[0056] First, a layer of infrared highly reflective Ag thin film with a thickness of 100nm was plate...

Embodiment 3

[0063] A carbon film-assisted solar selective absorption film system 3 and a preparation method thereof.

[0064] The structure of this absorbing film is as attached figure 1 As shown, the thickness composition of each film layer is as follows:

[0065] Al foil substrate / TiN x o y Thin film (150nm) / Amorphous carbon thin film (20nm) / Si 3 N 4 Thin film (60nm) / SiO 2 Thin film (50nm).

[0066] The reflection spectrum of the film system is attached image 3 As shown, the technical indicators of the film system are as follows:

[0067] According to the national standard GB / T6424-2007 and GB / T 4271-2007, the absorption rate of the film system reaches 97.2%, and the emissivity is 3.6%.

[0068] Taking the process parameters of the magnetron sputtering equipment used in this embodiment as an example, the preparation method of this absorbing film system is as follows:

[0069] First, using the magnetron sputtering method, using Al foil as the substrate, ceramic TiN as the targe...

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Abstract

The invention discloses a carbon film auxiliary solar energy selective absorption film system and a preparation method thereof. The absorption film system comprises a titanium oxynitride thin film, an amorphous carbon thin film, a silicon nitride thin film and a silicon dioxide thin film, which are plated on a metal substrate. Through introducing the amorphous carbon thin film, the solar energy absorption rate of the absorption film system is up to 98.0 percent, the emission rate can be reduced to 2.3 percent; and the absorption film system has extremely-high photo-thermal conversion efficiency and heat collection efficiency, is superior to the current international advanced level and can be widely applied to various solar energy photo-thermal converters. Compared with a heat absorption film of a conventional flat plate heat collector, the absorption film system has the advantages that after the amorphous carbon auxiliary heat absorption thin film is added, the solar energy absorption rate of the film system can be further improved, and meanwhile, the very low emission rate is kept; and the absorption film system can be continuously plated on a large-area substrate through an industrial magnetron sputtering preparation method, so that the effect of efficient production at a low cost is realized.

Description

technical field [0001] The invention relates to the field of heat-absorbing films for solar heat collectors and photothermal conversion materials, in particular to a carbon film-assisted solar selective absorbing film system and a preparation method thereof. technical background [0002] With the rapid development of modern society and economy, the human demand for energy is increasing. However, the reserves of traditional energy such as coal, oil, and natural gas continue to decrease and become increasingly scarce, resulting in rising prices. At the same time, the environmental pollution caused by conventional fossil fuels is also becoming more and more serious. These greatly limit the development of society and the improvement of human life quality. . Energy issues have become one of the most prominent issues in the contemporary world. Therefore, seeking new energy sources, especially non-polluting clean energy sources has become a research hotspot. [0003] Solar energ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F24J2/48C23C14/06C23C14/10B32B9/04
CPCY02E10/40Y02P80/20
Inventor 陆卫陈飞良王少伟俞立明刘星星郭少令陈效双王晓芳
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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