Photoresist removing method
A technology of photoresist and photoresist layer, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., and can solve problems such as low process reliability
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[0027] The method for removing photoresist proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.
[0028] The core idea of the present invention is to provide a photoresist removal method, which uses an oxygen-containing gas to perform a first ashing process on the photoresist layer to remove part of the photoresist layer; The resist layer is subjected to a second ashing process to remove the remaining photoresist layer. Since the second ashing process is performed on the remaining photoresist layer by using nitrogen-containing gas to remove the remaining photore...
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