Method for growing white color diamonds by using diborane and nitrogen in combination in a microwave plasma chemical vapor deposition system
A technology of chemical vapor deposition and microwave plasma, which is applied in the direction of chemical instruments and methods, diamond, and chemically reactive gases, can solve the problems of increased defect density and slow growth rate
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[0055] The method of growing single crystal diamond according to the present invention includes a CVD process using microwave plasma.
[0056] Diamond is grown on a substrate containing diamond seeds, which may be 3 x 3 mm to 5 x 5 mm in size. The method is carried out in a microwave plasma chamber.
[0057] The crystallographic orientation of the seeds was determined and seeds with an orientation other than (100) were excluded. The (100) oriented seed crystals are polished to roughness on the order of visible light wavelengths in the preparation method of the CVD process.
[0058] Once the seeds are in the chamber, the temperature inside the chamber is increased from room temperature to 750°C to 1200°C and the pressure inside the chamber is reduced to 120mbar to 160mbar.
[0059] A gas for diamond growth is supplied to the chamber, and the gas includes methane (CH 4 ), hydrogen (H 2 ), nitrogen combined with diborane (N 2 ) and helium (He) and the gases flowed through th...
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Abstract
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