Manufacturing method for solar cell
A technology of solar cells and manufacturing methods, applied in the direction of final product manufacturing, sustainable manufacturing/processing, circuits, etc., can solve the problems of low impurity concentration, high battery series resistance, etc., achieve improved effects, reduce damage and loss, and reduce reverse diffusion the effect of time
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Embodiment 1
[0036] Such as figure 1 Shown is a schematic flow chart of a method for manufacturing a solar cell according to Embodiment 1 of the present invention. The method specifically includes the following steps:
[0037] 1a. Perform N-type ion implantation on the P-type crystalline silicon wafer, so that phosphorus is implanted into the silicon wafer to form a PN junction. In this step, the energy of ion implantation is 50-60KV, the inclination angle is 7 degrees, and the rotation angle is 180 degrees. The dose is 1e13 / cm 2 ;
[0038] 2a. Deposit phosphosilicate glass 1 with a thickness of about 0.05 microns on the surface of the silicon wafer by magnetron sputtering. The concentration of phosphorus in phosphosilicate glass 1 is about 1e19 / cm 3 ;
[0039] 3a. Remove the phosphosilicate glass other than the electrode area on the upper surface of the silicon wafer; in this step, the phosphosilicate glass in the electrode area is retained by screen printing, and the phosphosilicate g...
Embodiment 2
[0048] The steps of this example are the same as those of Example 1, the difference lies in the process parameters of high-temperature diffusion in dry oxygen environment in step 5a (step 5). In this example, the process temperature of high-temperature diffusion is 1000°C, and the duration is 5 minutes .
Embodiment 3
[0050] The steps of this example are the same as those of Example 1, the difference lies in the process parameters of high-temperature diffusion in dry oxygen environment in step 5a (step 5). In this example, the process temperature of high-temperature diffusion is 1100°C, and the duration is 2 minutes .
[0051] After simulating the above three embodiments, it is found through comparison that with the increase of the diffusion temperature in the reverse diffusion process, the PN junction of the battery is continuously deepened. The impurity concentration on the surface of the battery first increases and then decreases, but the impurity concentration in the electrode region gradually increases with the increase of temperature. The heavily doped impurities in the electrode region mainly diffuse into the battery body, and the lateral diffusion is small. This is related to the deposition of the intrinsic amorphous silicon layer on the surface of the battery. Excessive lateral dif...
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Abstract
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