Manufacturing method of high-square-resistance solar cell
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SUZHOU TALESUN SOLAR TECH CO LTD
- Publication Date
- 2012-08-08
Abstract
Description
technical field
[0001] The invention relates to a method for manufacturing a battery, in particular to a method for manufacturing a high square resistance solar cell. Background technique
[0002] The PN emitter junction is the heart of crystalline silicon solar cells, and the quality of the P-N emitter junction directly affects cell efficiency. Generally, parameters such as sheet resistance, surface concentration, and junction depth are used to characterize the quality of the PN emitter junction.
[0003] The doping concentration curve of emitter junction with low surface concentration and shallow junction depth can be made by adjusting diffusion to help improve cell efficiency. The low surface concentration can reduce the surface recombination of the battery, and the shallow emitter junction can improve the blue light response of the battery. This type of battery generally has a relatively high square resistance value, which is called a high square resistance battery. ...