Full-solution-processed multilayered-structure transparent conductive thin film and preparation method thereof

A transparent conductive film, multi-layer structure technology, applied in cable/conductor manufacturing, conductive layer on insulating carrier, circuit, etc., can solve problems such as poor stability, unengineered, poor adhesion, etc., to achieve environmental stability High performance, excellent electrical performance and simple operation
CN103198884AActive Publication Date: 2013-07-10CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
3 Cites 22 Cited by

Patent Information

Authority / Receiving Office
CN ยท China
Patent Type
Applications(China)
Current Assignee / Owner
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Publication Date
2013-07-10

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention provides a full-solution-processed multilayered-structure transparent conductive thin film and a preparation method of the full-solution-processed multilayered-structure transparent conductive thin film, belongs to the technical field of conductive thin film materials, and solves technical problems that in the prior art, a single-layer-structure metal nanowire transparent conductive thin film is high in roughness, small in adhesive force and poor in stability, a preparation method of a multilayered-structure transparent conductive thin film is not in favor of preparing a large-area flexible transparent conductive thin film and cannot be engineered. According to the preparation method of the full-solution-processed multilayered-structure transparent conductive thin film, metal oxide semiconductor sols are used as raw materials of a dielectric layer, metal nanowires dispersed by organic solvents are used as raw materials of a metal layer, and the multilayered-structure transparent conductive thin film is prepared with adoption of a solution processing method. The preparation method of the full-solution-processed multilayered-structure transparent conductive thin film achieves large-area flexible production of the multilayered-structure transparent conductive thin film, and the prepared transparent conductive thin film is strong in adhesive force, high in visible light average transmittance (81.5%), low in surface roughness (2.1nm), high in environmental stability, and outstanding in photoelectric performance.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to a fully solution processed multilayer transparent conductive film and a preparation method thereof, belonging to the technical field of conductive film materials. technical background

[0002] Transparent conductive film is an important optoelectronic functional film, which is widely used in optoelectronic devices such as liquid crystal display, organic light emitting diode, touch screen and thin film solar cell. The future development trend of optoelectronic devices is high performance, low cost, flexibility and light weight, so higher requirements are put forward for the transparent conductive films used in them. The most commonly used and commercialized transparent conductive film is indium tin oxide (ITO) film, which has high visible light transmittance and low resistivity, and is often used in organic solar cells and organic light-emitting diodes. And other optoelectronic devices as transparent electrodes. However, the s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More