PDMS (polydimethylsiloxane)-based functional polymer patterning method

Abstract

The invention relates to a PDMS (polydimethylsiloxane)-based functional polymer patterning method. The method comprises the steps of: firstly, obtaining the required micro-nano size of a pattern at the surface of a light-sensitive lacquer by using a lithography method; coating an un-crosslinked organic material PDMS at the surface of the patterned light-sensitive lacquer, and taking down the organic material PDMS after cross-linking, so as to finish the fabrication of a soft template; spinning one surface of the soft temperature, provided with the structure, on a functional polymer substrate; and achieving the patterning of different functional polymers by the hot stamping or the ultraviolet imprinting. A hard template does not need to be defined as an initial structure, and just the patterning of the light-sensitive lacquer is needed. Meanwhile, the anti-sticking treatment is not needed in a PMMA (polymethyl methacrylate) template for the initial definition; the pattern of the PMMA can be transferred; the experimental procedure can be reduced; the transfer cost is reduced; and the fidelity of the pattern is improved. Furthermore, the PDMS soft template does not need the anti-sticking treatment. Meanwhile, the requirement on the levelness of a final substrate B is low; and the imprinting of a large-range feature structure can be achieved.

Description

technical field [0001] The invention relates to a polymer patterning method, in particular to a PDMS-based functional polymer patterning method. Background technique [0002] In recent years, with the deepening of research on functional polymers, more and more attention has been paid to the micro-nano structuring of functional organic polymer films in their corresponding fields. For example, the wide application of light-emitting polymers in light-emitting materials, the rapid development of conductive polymers in the semiconductor field, the sudden emergence of ferroelectric polymers in the storage field, and so on. These are inseparable from the patterning of different functional polymers. [0003] In the preparation process of patterned functional polymers, there are mainly two methods: top-down and bottom-up. Bottom-up mainly uses the self-assembly of polymers. Although this method can obtain large-area samples, the fluctuation of the structure is relatively large, and...

AI Technical Summary

Problems solved by technology

[0004] Silicon-based, glass-based or gem-based hard templates have poor mechanical toughness, cumbersome acquisition steps, and are quite expensive, which have always been the key constraints limiting the popularization of nanoimprinting technology

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