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Technology for high-transmittance, high-performance and low-emissivity glass

A low-radiation glass and high transmittance technology, applied in the field of coated glass manufacturing process, can solve the problems of low radiation and processing resistance, low processing performance, low transmittance of coated glass, etc., to solve low processing performance, Low-radiation processing resistance, the effect of improving photothermal selectivity

Inactive Publication Date: 2013-09-11
SHANGHAI NORTH GLASS COATING TECHNOLOGY INDUSTRIAL CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] The invention provides a manufacturing process of coated glass with high transmittance, low radiation and high processing resistance, which effectively solves the problems of low transmittance and low processability of existing coated glass

Method used

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  • Technology for high-transmittance, high-performance and low-emissivity glass
  • Technology for high-transmittance, high-performance and low-emissivity glass

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Embodiment approach

[0020] In the first embodiment of the present invention, please continue to refer to figure 1 shown. The above-mentioned silicon nitride (Si3N4) dielectric layer 2 is deposited under the conditions that the ratio of nitrogen to argon is 1:1.2 to 1.5 and the vacuum sputtering pressure is between 2.0E-3mbar and 6.0E-3mbar, And the power is between 15KW and 50KW, so that the deposited film thickness of the silicon nitride (Si3N4) dielectric layer 2 is between 16nm and 30nm.

[0021] In the second embodiment of the present invention, the above-mentioned zinc oxide dielectric layer 3 adopts the conditions that the ratio of oxygen to argon is 1.2 to 1.5:1 and the vacuum sputtering pressure is between 2.0E-3mbar and 3.0E-3mbar The deposition is carried out under the power of 15KW to 50KW, so that the zinc oxide dielectric layer 3 is deposited with a film thickness of 16nm to 30nm.

[0022] In the third embodiment of the present invention, the above-mentioned silver (Ag) layer is us...

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Abstract

The invention discloses a technology for high-transmittance, high-performance and low-emissivity glass. According to the technology, a glass substrate is provided, and a silicon nitride dielectric layer, a zinc oxide dielectric layer, a silver functional layer, a nickel-chromium alloy target alloy layer and a two-layer composite dielectric layer comprising a zinc tin antimony oxide layer and a silicon nitride layer are sequentially coated on the glass substrate. According to the technology for the high-transmittance, high-performance and low-emissivity glass, a multilayer film layer structure which is high in reflectivity to an infrared region and low in absorption property to near infrared and far infrared is coated on the surface of the glass substrate by an offline megnetron sputtering technology and at least comprises the silver functional layer capable radiating the sunshine; the high-transmittance, high-performance and low-emissivity glass has the characteristics of flexibility in adjustment of transmittance, absorption and reflection values and can effectively reduce the emissivity rate of the glass and increase the glass thermal resistance; furthermore, the required color and the required sunshade coefficient can be obtained. Moreover, the visible transmittance and the photothermal selectivity of the glass substrate surface can be effectively improved.

Description

technical field [0001] The invention relates to a manufacturing method of sputtering coated glass, in particular to a manufacturing process of coated glass with high transmittance and low radiation. Background technique [0002] At present, in order to reduce the emissivity and shading coefficient of coated products, enterprises generally adopt the method of increasing the thickness of the functional layer, but the increase in the thickness of the functional layer will cause the decrease of the transmittance of the glass; and in order to increase the transmittance of the coated product The overrate is generally realized by reducing the thickness of the metal barrier layer, so the processing performance of the product will also be reduced. Contents of the invention [0003] The invention provides a manufacturing process of a coated glass with high transmittance, low radiation and high processing resistance, which effectively solves the problems of low transmittance and low ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/36
Inventor 穆键郭爽
Owner SHANGHAI NORTH GLASS COATING TECHNOLOGY INDUSTRIAL CO LTD
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